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Conference: 46th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication

Conference: 46th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
会议:第46届电子、离子和光子束技术与纳米加工国际会议
批准号:
0226438
负责人:
Henry Smith
金额:
$0.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2002
资助国家:
美国
项目状态:
已结题
起止时间:
2002-06-01 至 2002-11-30

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中文摘要
翻译
第46届电子、离子和光子束技术及纳米制造国际会议将于2002年5月28日至31日在加利福尼亚州阿纳海姆举行,会议由美国真空学会与IEEE电子器件学会和美国光学学会合作主办,将为科学和技术交流提供一个论坛,以推进纳米/微制造的实践和进展,电子和离子光刻,粒子束光学和纳米纤维的前沿应用。会议将使学生能够向高层次的国际科学界展示他们的研究。 学生将观察科学家和工程师如何在会议上交流思想和信息,他们将听到最新的纳米技术研究成果的第一手介绍。 学生将进行个人接触并了解就业机会。 在一个特殊的学生早餐会上,会议组织者将向与会者描述会议计划是如何安排的。
英文摘要
The 46th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication 2002, sponsored by the American Vacuum Society in cooperation with the Electron Device Society of IEEE and the Optical Society of America, to be held in Anaheim, CA on May 28-31, 2002 will provide a forum for scientific and technical exchange to advance the practice and progress of nano/microfabrication, electron and ion lithographies, particle beam optics, and forefront applications of nanofabrication.The conference will enable students to present their research to a high-level international scientific community. Students will observe how scientists and engineers exchange ideas and information at conferences, and they will hear first hand presentations of up-to-date research results in nanotechnology. Students will make personal contacts and learn of employment opportunities. In a special student breakfast, the conference organizers will describe to the attendees how the conference program is put together.
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会议论文
Support of student travel to the EIPBN conference. To be held at the Gaylord Opryland Resort, Nashville, Tennessee, May 28-31, 2013.
University of the Virgin Islands: Living on Earth III: Social-Ecological Systems Workshop 2012, October 24-28, 2012
  • 批准号:
    1237410
  • 项目类别:
    Standard Grant
  • 资助金额:
    $17.23万
  • 财政年份:
    2012
  • 负责人:
    Henry Smith
  • 依托单位:
Support of student travel to EIPBN 12
SBIR Phase II: Nanometer-Level Fidelity in Maskless Lithography
  • 批准号:
    1058417
  • 项目类别:
    Standard Grant
  • 资助金额:
    $49.99万
  • 财政年份:
    2011
  • 负责人:
    Henry Smith
  • 依托单位:
海外基金