An Investigation into the Fundamental Principles of Plasmaless Si Etching

在这个由化学系实验物理化学计划资助的项目中，麻省理工学院的Sylvia T.Ceyer教授和她的博士后和研究生研究人员将使用分子束和表面科学相结合的方法，研究用各种含氟分子对硅进行无等离子体刻蚀。这项研究的最终目标是更多地了解无等离子体刻蚀背后的潜在化学原理。这项研究的结果可能会改善半导体行业的技术。除了拟议研究的更广泛的技术影响外，从事这一项目的年轻研究人员将获得一些复杂研究方法的专业知识，这将使他们能够在行业或学术界追求职业生涯。塞耶教授将把她的研究成果纳入高中化学教师的研讨会，以及主要面向本科生的本科生报告中。

In this project, funded by the Experimental Physical Chemistry Program of the Chemistry Division, Prof. Sylvia T. Ceyer of the Massachusetts Institute of Technology and her postdoctoral and graduate student researchers will investigate the plasmaless etching of Si with a variety of fluorine containing molecules using a combination of molecular beam and surface science methods. The ultimate goal of this research is to learn more about the underlying chemical principles behind plasmaless etching. Results from this research may result in improved technology in the semiconductor industry.In addition to the broader technological impact of the proposed research, the young researchers working on this project will gain expertise in a number of sophisticated research methods, which will allow them to pursue careers in either industry or academia. Prof. Ceyer will incorporate results from her research into workshops for teachers of high school chemistry and into presentations for undergraduates at primarily undergraduate institutions.