The Roles of Lattice Vibrational Excitation and Product Electronic Excitation in Dissociative Chemisorption on Covalent Solids

晶格振动激发和产物电子激发在共价固体解离化学吸附中的作用

• 批准号: 9713276
• 负责人: Sylvia Ceyer
• 金额: --
• 依托单位: Massachusetts Institute of Technology
• 依托单位国家: 美国
• 项目类别: Continuing grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-01-01 至 2000-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9713276&HistoricalAwards=false
• 关键词: Roles; Lattice; Vibrational; Excitation; Product

This research project, supported by the Analytical and Surface Chemistry Program, is concerned with the dynamics of halogen interactions with silicon surfaces. Using molecular beam scattering methods, Professor Ceyer and her colleagues at MIT will test the hypothesis that the high reactivity of XeF2 (as compared with F atoms) with silicon is due to the large energy transfer that occurs upon collision of the XeF2 molecule with the silicon lattice. This is counter to what would be expected thermodynamically. Using a range of fluorine`carriers` with differing masses, this hypothesis will be directly tested. In addition, the detailed dynamics of abstractive chemisorption will be probed by monitoring emission from electronically excited XeF* species which may result from the interactions of XeF2 with the silicon surface. The etching of silicon by fluorine containing species forms a part of silicon etching technology, with applications in the production of electronic devices. This research project addresses fundamental questions about the dynamics of surfaces. Using a range of molecular beam and surface sensitive spectroscopic methods, the effect of collisional excitation of the silicon lattice on the reaction dynamics will be probed. The dynamics of abstractive dissociative chemisorption of fluorine containing molecules will also be investigated.

该研究项目由分析和表面化学计划支持，关注卤素与硅表面相互作用的动力学。 使用分子束散射方法，Ceyer教授和她在麻省理工学院的同事将测试XeF2与硅的高反应性（与F原子相比）是由于XeF2分子与硅晶格碰撞时发生的大能量转移的假设。 这与预期的结果相反。 使用一系列具有不同质量的氟“载体”，将直接检验这一假设。 此外，抽象的化学吸附的详细动力学将通过监测电子激发的XeF2 * 物种，这可能会导致与硅表面的相互作用的发射探测。 通过含氟物质蚀刻硅形成硅蚀刻技术的一部分，其应用于电子器件的生产。 这个研究项目解决了关于表面动力学的基本问题。 使用一系列的分子束和表面敏感光谱方法，碰撞激发的硅晶格上的反应动力学的影响将被探测。 含氟分子的抽象解离化学吸附动力学也将被研究。