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Collision Induced Surface Processes

Collision Induced Surface Processes
碰撞引起的表面处理
批准号:
9020623
负责人:
Sylvia Ceyer
金额:
$0.0万
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1991
资助国家:
美国
项目状态:
已结题
起止时间:
1991-01-15 至 1994-06-30

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中文摘要
翻译
在分析和表面化学的一般领域,研究的重点是由气体粒子与表面结合的物质碰撞引起的表面过程。这项工作解决了重要的“压力差距”,试图将超高真空和低压下的化学与高压下的实际情况联系起来。如果表面科学研究要影响许多重要的应用,这种类型的调查是必要的。目前对吸附剂的离解化学吸附的研究将扩展到检查以前未记录的碰撞诱导表面过程。碰撞诱导离解化学吸附将作为一种探索吸附物热离解反应坐标的方法和合成新型吸附物的工具。将审查这些过程的机制。分子束技术将与高分辨率电子能量损失光谱相结合,用于这些研究,这种光谱也将发展为地下和体振动的探针。
英文摘要
The research, in the general area of Analytical and Surface Chemistry, focuses on surface processes that are induced by collisions of gas particles with surface bound species. The work addresses the important "pressure gap" which attempts to relate chemistry at ultra-high vacuum and low pressures to real situations at high pressure. This type of investigation is needed if surface science studies are to impact many important applications. The current studies of dissociative chemisorption of adsorbates will be extended to examine previously undocumented collision induced surface processes. Collision induced dissociative chemisorption will be developed as a method to probe the reaction coordinate for thermal dissociation of adsorbates and as a tool to synthesize novel adsorbates. Mechanisms for these processes will be examined. Molecular beam techniques will be coupled with high resolution electron energy loss spectroscopy for these studies, and this spectroscopy will also be developed as a probe for subsurface and bulk vibrations.
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会议论文
Exploration of Non-Equilibrium Interfacial Phenomena in Spin Forbidden Oxidation
An Investigation into the Fundamental Principles of Plasmaless Si Etching
Dynamics of the Reaction of Xenon Difluoride with Si(100)
The Roles of Lattice Vibrational Excitation and Product Electronic Excitation in Dissociative Chemisorption on Covalent Solids
国内基金
海外基金
炎性反应中巨噬细胞激活诱导死亡(activation-induced cell death,AICD)的机理研究
  • 批准号:
    30330260
  • 项目类别:
    重点项目
  • 资助金额:
    105.0万元
  • 批准年份:
    2003
  • 负责人:
    顾军
  • 依托单位: