The 51st International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2007

该补助金支持研究生参加2007年5月29日至6月1日在科罗拉多丹佛举行的第51届电子、离子和光子束技术与纳米纤维国际会议。在纳米纤维，电子和离子光刻，光子和压印光刻，粒子束光学和纳米纤维的前沿应用领域，这次会议是卓越的。该提案的智力价值包括分享研究成果，更广泛的影响是对参与会议的学生的影响。 学生将展示他们的研究，这将使他们能够练习他们的演讲和沟通技巧。 学生们还将参与会议组织者的演讲，这将让他们更多地了解如何组织会议。 他们将学习如何将会议计划放在一起，以及会议场地和其他后勤的组织。 这项研究将对参与的学生产生良好的影响，并将帮助他们为未来在专业社会中的领导机会做好准备。

This grant supports the attendance of graduate students to the 51st International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2007, to be held in Denver, Colorado, May 29 to June 1, 2007. In the fields of nanofabrication, electron and ion lithographies, photon and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent. The intellectual merit of the proposal includes the sharing of research findings and the broader impacts are in the impact on the students involved in the conference. The students will present their research, which will allow them to practice their presentation and communication skills. The students will also be involved in a presentation by the conference organizers that will let them learn more about how to organize a conference. They will learn about putting the conference program together and the organization of the conference venue and other logistics. This research will have a good impact on the students involved and will help them prepare for future leadership opportunities in professional societies.