课题基金 / 基金详情

Student Travel Support for the 2008 Gaseous Electronics Conference (GEC)

Student Travel Support for the 2008 Gaseous Electronics Conference (GEC)
2008 年气体电子会议 (GEC) 的学生旅行支持
批准号:
0838909
负责人:
Lawrence Overzet
金额:
$1.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2008
资助国家:
美国
项目状态:
已结题
起止时间:
2008-08-01 至 2009-07-31

项目摘要

项目成果

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中文摘要
翻译
该奖项为学生提供旅行和参加2008年气体电子会议的支持。会议的重点是结合原子,分子和光学物理与电气放电物理,化学和工程方面。 气体电子会议汇集了原子,分子和光学物理社区的成员,以及对气体放电和等离子体应用感兴趣的研究人员。会议将于2008年10月13日至17日在德克萨斯州的达拉斯举行。支持仅限于在美国攻读博士学位的学生,他们将在会议上发表论文。支持是竞争性的,将基于个人对会议成功的预期贡献。 支持是由两个物理司的等离子体物理程序和化学,生物工程,环境和运输系统的司燃烧和等离子体系统程序提供。
英文摘要
This award provides support for student travel to and participation in the 2008 Gaseous Electronics Conference. The meeting focuses on combining aspects of atomic, molecular, and optical physics with electric gas discharge physics, chemistry and engineering. The Gaseous Electronics Conference brings together members of the atomic, molecular, and optical physics communities with researchers interested in applications of gas discharges and plasmas. The conference is being held in Dallas, TX from 13-17 October, 2008. Support is limited to students enrolled in a Ph.D program in the United States who are presenting a paper at the conference. Support is competitive and will be based on the anticipated contribution by the individual to the success of conference. Support is provided by both the Plasma Physics Program in the Physics Division and the Combustion and Plasma Systems Program in the Divison of Chemical, Bioengineering, Environmental, and Transport Systems.
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会议论文
MRI: Acquisition of Electron-Beam Lithography for Nanofabrication in the North Texas Region
  • 批准号:
    1126224
  • 项目类别:
    Standard Grant
  • 资助金额:
    $70.0万
  • 财政年份:
    2011
  • 负责人:
    Lawrence Overzet
  • 依托单位:
Acquisition of a Plasma Science Research and Research Training Laboratory at UTD.
  • 批准号:
    0079783
  • 项目类别:
    Standard Grant
  • 资助金额:
    $58.0万
  • 财政年份:
    2000
  • 负责人:
    Lawrence Overzet
  • 依托单位:
NYI: Pulsed Discharge Processing
  • 批准号:
    9257383
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $33.75万
  • 财政年份:
    1992
  • 负责人:
    Lawrence Overzet
  • 依托单位:
Research Initiation: Negative Ion and Modulated Discharge Processing Studies (REU SUPPLEMENT)
  • 批准号:
    9009662
  • 项目类别:
    Standard Grant
  • 资助金额:
    $8.89万
  • 财政年份:
    1990
  • 负责人:
    Lawrence Overzet
  • 依托单位:
海外基金