Mechanics of Strain-Driven Nanopatterning in Alloy Systems

CMMI 0855853：合金系统中应变驱动纳米图案化的力学PI：Vivek B。Shenoy，布朗大学随着集成电路技术正在接近其物理限制与目前的光刻图案化方法，新的方法与改进的空间分辨率是需要保持这个2000亿美元的市场稳定。 由弹性相互作用驱动的自下而上或自组装方法被广泛认为是用于制造诸如纳米线、量子点和纳米级表面图案的结构的有前途的技术。然而，为了遵循这种方法并以期望的方式创建结构，设计图案在自组装期间采用的尺寸和形状的可靠手段是必不可少的。在拟议的工作中，合金化将被探索作为一种手段，以实现控制的形状，尺寸和空间图案的应变自组装结构的表面。研究人员将开发计算模型，占独特的合金系统，如运输性能和偏析形态依赖的弹性场引起的差异的功能。材料参数的组成和应变依赖性将从原子尺度模拟中获得。研究人员与半导体行业的一个实验小组有着密切的联系，这将允许对拟议的建模工作进行直接评估。该项目将开发的多尺度方法将广泛适用于分析各种材料系统中的纳米级图案，但当前的重点将是Si表面与Ge的合金化。Ge/Si系统的优点在于，除了在可再生能源设备和生物传感器中的潜在应用之外，它还与发展良好的Si集成电路制造技术天然兼容。该项目将为学生提供与半导体行业的实验人员合作并发展高级计算技能的机会。在这个项目中接受培训的学生将能够在学术界以及半导体和能源行业从事职业生涯。在计算方法方面取得的进展将包括在PI为促进实践模拟经验而创建的课程中。

CMMI 0855853: Mechanics of Strain-Driven Nanopatterning in Alloy SystemsPI: Vivek B. Shenoy, Brown UniversityAs integrated circuit technologies are approaching their physical limitations with current lithographic patterning methods, new approaches with improved spatial resolution are required to keep this $200 billion market stable. A bottom up or self-assembly approach driven by the elastic interactions is widely viewed as a promising technique for the fabrication of structures such as nanowires, quantum dots and nanoscale surface patterns. However, to follow this approach and create structures in a desired manner, a reliable means to engineer the size and shapes that the patterns adopt during self-assembly is essential. In the proposed work, alloying will be explored as a means to achieve control over the shape, size and spatial pattering of strained self-assembled structures on surfaces. The investigator will develop computational models that accounts for features unique to alloyed systems such as differences in transport properties and segregation induced by morphology dependent elastic fields. The composition and strain dependence of the material parameters will be obtained from atomic scale simulations. The investigator has close ties with an experimental group based in the semiconductor industry, which will allow for direct assessment of the proposed modeling effort. The multiscale methods that will be developed in the project will be broadly applicable to analyze nanoscale patterning in a variety of material systems, but the immediate focus will be on alloying of Si surfaces with Ge. The Ge/Si system has the advantage that in addition to potential applications in renewable energy devices and biological sensors, it is also naturally compatible with the well developed Si integrated circuit fabrication technology. The project will provide an opportunity for students to both collaborate with experimentalists in the semiconductor industry and to develop advanced computational skills. The students trained on this project will be well positioned to pursue careers in academia and in the semiconductor and energy industries. The progress made in the computational methods will be included in the course that the PI has created to promote hands-on simulation experience.