New Models and Methods for the Effective Orthogonal Layout of Graphs

正交图绘制是一个深入研究和建立良好的模型绘制图形，它可以追溯到超大规模集成电路布局和平面规划的应用。由于其在实际应用中的高度重要性，多年来已经提出了一些有效的算法，提供良好的美学和良好的可读性。然而，由于固有的局限性，也由于模型的简单性，也存在一些缺陷，似乎是不可避免的。在这个项目的第一阶段，我们发现了这些缺点，并提出了两个主要的替代模型。第一个模型是平滑正交图绘制模型（Smog，简称Smog），它将正交布局的刚性和清晰度与所谓Lombardi绘图的艺术风格和美学吸引力相结合。第二个模型是倾斜正交图绘制模型（Slog，简称Slog），它允许对角线段，同时保留原始正交端口，特别是简化交叉点的可识别性。在项目的第一阶段，研究主要侧重于介绍方法基础。在第二阶段，我们计划进一步继续我们的理论研究，并将我们在项目第一阶段获得的知识应用于不同的应用领域，旨在将特定领域的需求集成到我们的模型中。

Orthogonal graph drawing is an intensively studied and well-established model for drawing graphs, which traces back to VLSI layouts and floor-planning applications. Due to its high importance in practical applications, several efficient algorithms providing good aesthetics and good readability have been proposed over the years. However, due to the inherent limitations but also because of the simplicity of the model, there exist also some drawbacks that seem to be unavoidable. In the first phase of this project, we identified these drawbacks and suggested two main alternative models. The first model is the smooth orthogonal graph drawing model (Smog, for short), which combines the rigidity and clarity of orthogonal layouts with the artistic style and aesthetic appeal of the so-called Lombardi drawings.The second model is the slanted orthogonal drawing model (Slog, for short), which allows diagonal segments, while keeping the original orthogonal ports, in particular to simplify the recognizability of the crossings. In the first phase of the project, the research mainly focused on introducing methodological foundations. In the second phase, we plan to further continue our theoretical study and also to apply the knowledge we gained in the first phase of the project to diverse application areas aiming in integrating domain-specific requirements in our models.