Development of a new ion-beam sputtering apparatus and its application for scanning electron microscopy.

研制了一种用于高分辨率扫描电镜的离子束溅射镀膜机。配有试样室（离子束枪、试样台、金属靶和厚度监测器）、控制单元和真空系统。用该装置可制得由直径约为15-20 A的细小铂颗粒组成的极薄金属薄膜。颗粒的大小比普通离子溅射镀膜机（直径50-60 A）得到的颗粒小得多。钽和钨也可用作涂层金属。在超高分辨率扫描电子显微镜下观察，新型涂布剂薄涂后的试样具有足够的电导率和二次电子产率，可以拍摄出对比度较好的照片。因此，新研制的离子束溅射镀膜机与普通离子溅射镀膜机相比，具有很高的镀膜能力，在超高分辨率扫描电镜下发挥了巨大的作用。在未来，该仪器必将成为该研究领域的必要设备。

An ion beam sputter coater for high resolution scanning electron microscopy was newly developed. It is equipped with a specimen chamber (an ion beam gun, a specimen stage, metal targets and a thickness monitor), control units and a vacuum system. With this apparatus, very thin metal film which is composed of fine platinum particles of about 15-20 A in diameter was obtained. The size of the particles is much smaller than that obtained by ordinary ion sputter coater (50-60 A in diameter). Tantalum and tungsten can be also used as coating metals. On observation with an ultra high resolution scanning electron microscope, the specimens which had been thinly coated by the new coater provided enough conductivity and yield of secondary electrons for taking pictures in good contrast. Thus the newly developed ion beam sputter coater have very high ability in compare with the ordinary ion sputter coater and it exercises its power at ultra high resolution scanning electron microscopy. In the future, this apparatus surely become a necessary in this research field.