Synthesis of Functional Ceramics Thin Films by Dual Ion Beam Sputtering Method

介绍了双离子束溅射沉积功能陶瓷薄膜的方法。用氩离子束溅射金属靶片，在衬底上提供金属原子通量，用反应离子束直接在生长膜表面提供反应气体离子通量。本研究旨在阐明离子束轰击对生长薄膜表面的影响及其机理。在本研究中，吨位束轰击对于控制低温衬底上形成的陶瓷薄膜的结晶和晶体取向是有用的。在实验结果的基础上，我们提出了一个简单的理论模型，可以预测离子束轰击生长膜表面的合成、生长和刻蚀行为。该模型有待于进一步的研究来验证。我们还报道了离子束合成TIOL， TiN, (TiAIV) N， AIN陶瓷薄膜的性能和晶体取向。

Dual ion beam sputtering method for deposition of functional ceramics thin films is described. The metal atom flux was supplied on substrate by sputtering a metal target wi th an Ar ion beam, while the reactive gas ion flux was supplied directly on the growing film surface by a reactive ion beam. The present research aims at elucidating the effects and the mechanisms of ion beam bombardment to the growing film surface. In this research, it is clear that the ton beam bombardment is useful for controlling the crystallization and the crystal orientation of ceramics thin film formed on low temperature substrate. On basis of the experimental results, we have suggested a simple theoretical model which can predict a synthesis, growth and etching behavior on growing film surface by ion beam bombardment. This model must be verified by the further study. We have also reported on the properties and the crystal orientation of ion beam synthesized TIOL, TiN, (TiAIV) N, AIN ceramics thin films.