Surface modifications by metal-nitride functionally gradient films

采用Ar+N_2混合气体对金属靶进行射频反应溅射，制备了由金属相和氮相组成的梯度膜。本文提出了两种合成梯度金属氮化膜的方法。一种是N2分压-总压比（P_<N2>/P_<total>）控制方法，另一种是射频功率控制方法。在室温和200℃的温度下，在玻片上制备了梯度金属氮化膜。利用x射线衍射仪、俄歇能谱仪和扫描电镜对沉积膜的晶体结构、成分和形貌进行了表征。为了比较，我们使用了两种金属靶材（Al和Ti）来沉积成分梯度薄膜。采用P_<N2>/P_<total>和rf功率控制方法均可生长组成梯度薄膜。结果表明，沉积膜具有金属层上有氮层的结构。薄膜的形态很大程度上取决于衬底温度，而与沉积方法无关。研究还表明，发射光谱和质谱是监测这些薄膜生长的有效工具。

The rf reactive sputtering of metal target on Ar+N_2 mixed gas was applied to fabricate the compositionally gradient films consisting of metal and nitride phases. In this work, two methods are presented to form the ompositionally gradient metaL-nitride films. The first is the N_2 partial pressure-to-total pressure ratio (P_<N2>/P_<total>) control method, and the other is the rf power control method. The compositionally gradient metal-nitride films were deposited onto slide glasses, and the subsrate temperature were room temperature and 200ﾟC.The crystallographic structure, the compositon and the morphology of deposited films were characterized by X-ray diffractometry, Auger electron spectroscopy and scanning electron microscopy, respectively. For comparison, two metal targets(Al and Ti) were used to deposit the compositionally gradient films.Both P_<N2>/P_<total> and rf power cotrol method can be used to grow compositionally gradient films. It is demonstrated that the deposited film has the structure with a nitride layr on a metal layr. The morphology of the films is greatly dependent on the substrate temperature, independently of the deposition method. It is also shown that the optical emission spectroscopy and the mass spectroscopy are useful tools to monitor the growth of these films.