Low-pressure Chemical Vapour Deposition System

为了获得高光学质量的薄膜，需要低压化学气相沉积（LPCVD）系统。为了开展纳米光子学和量子光子学以及材料物理学的计划研究项目，有必要在晶圆尺度上沉积定制的氮化硅和二氧化硅薄膜。我们计划使用LPCVD生长高透明薄膜，这将使低损耗的纳米光学结构的创建成为可能。这些器件将用于实现光学谐振器，这些谐振器将用于量子光子学以及神经形态计算架构。该系统将特别用于生长多层结构，以实现具有3D特征的新光子电路。通过在软纳米科学中心（SoN）安装该仪器，该系统将提供给广泛的用户群。计划在纳米光子学、量子光子学和跨学科项目的研究项目将在新系统中重复进行，并将在SoN中产生协同效应。该仪器将为当前技术提供补充的纳米处理能力，并将与现有仪器兼容。

For growing thin films with high optical quality a low pressure chemical vapour deposition (LPCVD) system is needed.To carry out planned research projects in nanophotonics and quantum photonics, as well as in materials physics, it is necessary to deposit custom silicon nitride and silicon dioxide thin film on a waferscale. Using LPCVD we plan to grow highly transparent thin films which will enable the creation of nanooptical structures with low loss. These devices will be employed for realizing optical resonators which will be used for quantum photonics, as well as for neuromorphic computing architectures. The system will be used in particular to grow multi-layer structures to enable new photonic circuits with 3D features.By installing the instrument in the center for soft nanoscience (SoN), the system will be made available to a broad user base. Planned research projects in nanophotonics, quantum photonics and interdisciplinary projects at the Münster Nanofabrication Facility will be carried out reproducibly with the new system and will generate synergies in SoN. The instrument will provide complementary nanoprocessing capability to current technologies and will be compatible with existing instrumentation.