Low Pressure Chemical Vapour Deposition Growth of Graphene for Electronic Component Applications**

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Graphene has attracted global attention for its unprecedented material performance and potential impact on microelectronic devices, nano-materials, and other applications. Much research to date relies on small-area exfoliated graphene, which is a prohibitive method for scaled-up manufacturing of devices. Deposition of large-area graphene by chemical vapour deposition (CVD) has improved over the last few years with respect to mobility, grain size and cost, yet there is significant room for improvement in CVD graphene growth. This project is a collaboration between Kennedy Labs and the University of Waterloo that aims to explore low-pressure CVD as a means for growing high-quality, large-area graphene on a variety of substrate materials. A successful outcome will establish Canada as a source of industrial-quality graphene that will enable new technology development in both the industrial and academic sectors.