Applied Study on Ion Absorption Pump for Oxygen by a Reactive Cathode Sputter Discharge
Applied Study on Ion Absorption Pump for Oxygen by a Reactive Cathode Sputter Discharge
批准号:
11555008
负责人:
FUNATO Yasuyuki
金额:
$2.82万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B).
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000
中文摘要
1.对LaB6阴极溅射离子泵的研制和改进进行了基础实验。在直径为6 cm、由200 mm长的SUS-304制成的泵壳中,安装了厚度为5 mm、直径为50 mm的LaB6圆盘作为阴极。该实验装置由试制的LaB6离子泵、传统型钛泵和差动排气泵系统组成。采用超高真空电离规、质滤式分析仪和皮拉尼真空系统,使测量系统达到了令人满意的效果。对放电参数与泵浦特性(泵下特性、排气速度、分压动力学)之间的关系进行了详细的实验研究,验证了B膜和LaB6膜具有较高的氧气和水的排气速度。等离子体参数的测量。在辉光放电等离子体的电子密度、电子温度和空间电势方面,使用了朗缪尔探针。给出了泵的排气特性与溅射流量的关系,并对气体的释放、放电过程中的吸收行为、与壁面的循环行为、分压特性等进行了数值分析,得出了获得更高效率排气的条件。图像诊断。通过横截面照片的拍摄和图像处理,对溅射等离子体柱的形状进行了跟踪。这些都是优化等离子体生产条件以应用等离子体所必需的。对残余气体的精确测量分析。特别是对各分压下的排气速度进行了测量,得出了分压规律与真空到达程度的关系。
英文摘要
1. Basic experiment for production and improvement of the LaB6 cathode sputtering ion pump was carried out. In pump container of diameter of 6 cm and made of SUS-304 of the 200mm length, LaB6 disk of 5 mm thickness and 50mm diameter is installed as a cathode electrode.2. The experimental device consists of trial manufacture LaB6 ion pump, traditional-model titanium pump, and differential evacuation pump sysytem. The measurement system was made to be satisfactory by using ultrahigh-vacuum ionization gauge, mass filter type analyzer and Pirani vacuum system.3. The detailed experiment was carried out on the correlation of discharge parameters and pumping characteristic (Pump-down characteristics, exhaust velocity, partial pressure dynamics), and the experimental verification of high exhaust speed of oxygen and water for boron and LaB6 film was got.4. The measurement of plasma parameters. In respect of electron density, electron temperature and space potential of glow-discharge plasma, Langmuir probe was used. The relation of pump exhaust characteristic and sputter discharge became the evidence, and the condition for getting the more high-efficient exhaust was pursued Gas release, absorption behavior during the discharge, recycling behavior with the wall, partial pressure characteristics were analyzed numerically and the results were repored everywhere in the conferences.5. Image diagnostic. The shape of the sputter plasma column was pursued by photographing of the cross sectional photograph and the image processing. These are necessary for the optimization of the plasma production condition for application of the plasma.6. The precise measurement of the residual gas analysis. Especially, each exhaust speed for the partial pressure was measured, and the relation between partial pressure pattern and arrival degree of vacuum was pursued.
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Y. Funato: "Studies on a Magnetic Field Configuration for Plasma Processing"MEMOIRS of Suzuka National College of Technology. 32. 43-48 (1999)
Y. Funato:“等离子体处理的磁场配置的研究”铃鹿国立工业大学回忆录。
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南条徹: "ボロン化合物陰極を用いたN2/O2混合ガスグロー放電プラズマの特性"鈴鹿工業高等専門学校紀要. 33. 63-66 (2000)
Toru Nanjo:“使用硼化合物阴极的 N2/O2 混合气体辉光放电等离子体的特性”国立工业大学通报,铃鹿 33. 63-66 (2000)。
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Y. FUNATO: "Effects of Cathode Material on DC-Glow Discharge in N2/O2 Mixtures"Proc. Int. Conference Phenomena in Ionized Gases; 11-16, July, Warsaw. III. 27-28 (1999)
Y. FUNATO:“阴极材料对 N2/O2 混合物中直流辉光放电的影响”Proc。
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Y. Funato: "Dynamics of Nox Gases during a Glow Discharge with Sputter Discharge"BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, Vol. 44. 1・II. 1096-1096 (1999)
Y. Funato:“溅射放电辉光放电期间的氮氧化物气体动力学”,美国物理学会公报,第 44 卷,1・II。
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清岡千晶: "スパッタ放電のプラズマ密度、電位分布の測定"鈴鹿工業高等専門学校紀要. 31. 65-70 (1998)
Chiaki Kiyooka:“溅射放电的等离子体密度和电势分布的测量”国立技术学院通报,铃鹿31. 65-70 (1998)。
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共 11 条
System Construction and Execution for the expansive upgrading of the practice Education in the College of Technology
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批准号:13680214
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.18万
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财政年份:2001
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负责人:FUNATO Yasuyuki
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依托单位:
System Development for Practical Education of Specialized Subjects, Research and Graduation Thesis Research in a College of Technology
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批准号:10680207
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.7万
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财政年份:1998
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负责人:FUNATO Yasuyuki
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依托单位:
EXPERIMENTAL STUDY ON SPUTTER ION PUMP FOR WIDE PRESSURE RANGE
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批准号:05555011
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$1.47万
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财政年份:1993
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负责人:FUNATO Yasuyuki
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依托单位: