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Fabrication of noble nano-reaction field by synchrotron radiation etching and characterization by STM

Fabrication of noble nano-reaction field by synchrotron radiation etching and characterization by STM
同步辐射刻蚀制备惰性纳米反应场及STM表征
批准号:
12440202
负责人:
URISU Tsuneo
金额:
$9.79万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2003

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中文摘要
翻译
本研究以以下项目为主要研究对象;(a)测量同步辐射(SR)蚀刻的激发能依赖性,(b)利用SR蚀刻开发纳米结构制造技术,以及(c)开发这些技术的适当应用。得到了以下结果:(1)建设起伏波束线作为STM原位观测专用实验站。在IMS-UVSOR机器向更高一代改进的改造过程中,设计并制造了STM-波动波束线BL-7U和超高真空STM装置。该开发项目于2003年完成,并开放给实验性使用。结果表明,硅-氢键被SR辐照切断。这很有趣,因为已知Si(100)表面的Si- h对SR辐射是惰性的。(2)提出了生物纳米反应领域的新思路和“分子交流…更多交流”的新科技领域。提出了一种将硅表面含通道蛋白的脂质双分子层与纳米结构相结合制成的新型支撑膜生物传感器,并提出了制造该传感器所需的几种基本工艺技术;硅表面纳米结构制备技术、-CH_3和-COOH修饰等区域选择性表面化学修饰技术、囊泡融合沉积脂质双分子层技术等已基本发展成熟。该装置被认为是生命信息传输系统中携带信号分子的接收器。基于这一思路,我们提出了一个新的科技领域“分子通讯”。(3)埋藏金属层底物红外反射吸收光谱技术(BML-IRRASS)的发展与应用。将BML-IRRASS应用于Si(100)表面H原子与H_2O氧化反应的研究,发现了3对双重态的新振动带,这些双重态分别归属于不同Si背键氧化水平的SiH_2种。基于这些结果,BML-IRRAS的重要独特特征;首次明确了包括指纹区域在内的宽频率区域的高灵敏度和高分辨率,以及垂直于表面的过渡矩的选择规则。我们还发现,BML-IRRAS对固定在固体表面的生物材料的观察特别有用。少
英文摘要
The research was carried out considering the following items as the main targets; (a) measurements of the excitation energy dependence of the synchrotron radiation (SR) etching, (b) development of nano-structure fabrication techniques using SR-etching, and (c) development of the suitable application of these techniques. The following results have been obtained.(1)Construction of undulator beam line as the special experimental station for in-situ STM observations.:During the remodeling of IMS-UVSOR machine for improving to the higher generation, the STM-undulator beam line BL-7U and the ultra high vacuum STM apparatous were designed and constructed. The developments were completed at 2003 and opened to the experimental use. It was found that Si-H bonds are cut by the SR irradiation. This is interesting since the Si-H on Si(100) surface is known to be inert for the SR irradiations.(2)Proposal of new idea of bio-nano-reaction field and new science and technology field of "molecular commun … More ication".We proposed a new supported membrane bio-sensor, which are made by integrating the lipid bilayer containing channel proteins on the Si surface with nano-structure, and several elementary process techniques necessary to fabricate this device ; nano-structure fabrication technique of Si surface, area selective surface chemical modification techniques such as -CH_3 and -COOH modifications, deposition technique of lipid bilayer using vesicle fusion, etc. have been almost completely developed. This device is considered as the receiver of the signal-carrying molecules in the life information transmission system. Based on this idea, we proposed a new science and technology field "molecular communication".(3)Development and application of the technique of infrared reflection absorption spectroscopy using a buried metal layer substrate (BML-IRRASS),We applied the BML-IRRAS to the investigation of oxidation reactions of Si(100) surface using H atoms and H_2O, and found new vibration bands of 3 pairs of doublet, which are assigned to several SiH_2 species with different level of Si back bond oxidations. Based on these results, important unique characteristics of BML-IRRAS ; high sensitivity and high resolution in the wide frequency region including the finger print regions, and selection rule for the transition moment perpendicular to the surface, were clearly certified for the first time. We also found that the BML-IRRAS is especially useful for the observation of bio-materials immobilized on the solid surfaces. Less
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Yan-Jun Li: "Deposition of undecenoic acid self-assembled monolayers on H-Si (111) surfaces studied by AFM"Appl.Surf.Sci.. in printing. (2004)
Yan-Jun Li:“通过 AFM 研究十一碳烯酸自组装单层在 H-Si (111) 表面上的沉积”Appl.Surf.Sci.. 在印刷中。
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通讯作者:
Noritaka Takezoe: "Design and construction of UVSOR-BL4A2 beam line for nano-structure processing"Nucl.Instrum.Methods. A467. 1279-1281 (2001)
Noritaka Takezoe:“用于纳米结构加工的 UVSOR-BL4A2 光束线的设计和构造”Nucl.Instrum.Methods。
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通讯作者:
Zhi-Hong Wang: "Three pairs of doublet bands assigned to SiH_2 scissoring modes observed in H_2O-induced oxidation of Si(100) surfaces"Phys.Rev.. B69. 045309-045315 (2004)
王志宏:“在H_2O诱导的Si(100)表面氧化中观察到的三对双峰带分配给SiH_2剪切模式”Phys.Rev..B69。
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通讯作者:
Yan-Jun Li: "Deposition of 10-undecenoic acid self-assembled layers on H-Si(111) surfaces studied with AFM and FT-IR"Appl.Surf.Sci.. (in printing). (2004)
Yan-Jun Li:“用 AFM 和 FT-IR 研究在 H-Si(111) 表面上沉积 10-十一碳烯酸自组装层”Appl.Surf.Sci..(印刷中)。
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