Thin Film Formation by Particle Precipitation aided Chemical Vapor Deposition

化学气相沉积制备的超薄薄膜具有优异的电学和其他性能，可以成为半导体和材料领域开发的关注焦点。为了更好地利用CVD作为材料元素的这一特性，CVD的高效制造技术必须与控制薄膜均匀厚度和密度的操作条件相结合。从这一角度出发，探讨了粒子沉淀辅助化学气相沉积技术中薄膜形成的基本机理，包括自成核、粒子生长和粒子在基片上的收集过程。以下是从调查中得出的总结。作为在基板上沉积颗粒的薄膜制备实验的结果，实验研究了气体压力、物料和气体温度、气体速度等操作参数对气流中颗粒的产生和基板上成膜的影响。在考虑温度和质量场相互作用的情况下，分析了薄膜的形成过程，包括自成核、颗粒生长和颗粒在基板上的聚集等过程。通过与实验结果的对比，从理论上阐明了薄膜的形成和颗粒的输运过程。推导出了颗粒的产生速度和直径与操作参数的关系。在此基础上，获得了PPCVD制膜工艺的基本知识。

The very thin film made by Chemical Vapor Deposition have so superior characteristics in electric and the other properties, that they can become the center of the attention to open up in semiconductor and material fields. To make the best use of this characteristics as an element of material, the high efficiency manufacturing technology of CVD should be developed in conjunction with the operating condition of control the film at uniform thickness and density. From the standpoint, this study has been conducted to pursue the basic mechanism of thin film production in the particle precipitation aided CVD techniques including the process of self- nucleation, particle growth, and particle collection on the base. The following are the summery deduced from the investigation.1. As the results of thin film manufacturing experiments by depositing particles on the base plate, the characteristics of the particle production in gas-flow and the film formation on the base were experimentally made clear in connection with the operating parameter such as the gas pressure, the material and gas temperature, and the gas velocity.2. The film production, consisted of the processes such as self-nucleation, growth of particle and collection of particles on the base, was analyzed taking into account the interaction between the temperature and mass fields. By comparison with the experimental results, the film production and the transport process of particles were clarified analytically. The production velocity and diameter of particle were also deduced in relation to the operating parameters.3. On the basis of the above findings, the fundamental knowledge of film manufacturing process by PPCVD were obtained.