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A Study on Y Oxide High-Temperature Superconducting Thin Film Deposition by Pulsed Arc Plasma Discharges

A Study on Y Oxide High-Temperature Superconducting Thin Film Deposition by Pulsed Arc Plasma Discharges
脉冲电弧等离子体放电Y氧化物高温超导薄膜沉积研究
批准号:
04555062
负责人:
SUDA Yoshiaki
金额:
$2.05万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1992
资助国家:
日本
项目状态:
已结题
起止时间:
1992 至 1994

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中文摘要
翻译
自高T_c氧化物超导体被发现以来,人们对高灵敏度磁场探测器、开关器件和约瑟夫森器件等电子应用超导薄膜的开发产生了极大的兴趣和努力。脉冲电弧等离子体放电方法具有沉积速率高、化学计量比相当于块体(靶)材料、可以原位晶化和低温加工的优点。采用脉冲电弧等离子体放电和离轴磁控溅射方法溅射YBa2Cu3O;7-X;块材,在不加热的情况下在MgO(100)和SrTiO3(100)衬底上沉积YBaCuO薄膜。为了制备高质量的YBaCuO薄膜,对其等离子体性质和薄膜特性进行了研究。脉冲电弧等离子体放电沉积的薄膜具有基本的化学计量比。用发射光谱仪监测了过程等离子体的状态,得到了多条谱线I…更有认同感。并估算了激发温度。实验表明,脉冲弧光等离子体放电是制备YBaCuO超导薄膜的一种简单、廉价、有效的方法。本文还研究了用KrF脉冲激光沉积(PLD)在YSZ缓冲层柔性衬底上制备YBaCuO薄膜的方法。YBaCuO/YSZ/金属薄膜的c轴取向受YSZ缓冲层的取向控制。用有限元方法求解一维热传导方程,对激光辐照超导薄膜进行了数值研究。采用脉冲激光沉积的方法制备了立方氮化硼薄膜,可以作为YBaCuO薄膜的镀膜层。对脉冲弧光等离子体放电产生的电磁噪声进行了测量,脉冲弧光等离子体和脉冲激光的脉冲过程将获得新的良好效果。因此,对脉冲过程进行科学的、工业化的研究具有重要意义。较少
英文摘要
Since the discovery of high Tc oxide superconductors, there have been enormous interest and efforts to develop superconducting thin films for electronic applications including high sensitive magnetic field detector, switching device and a Josephson device.A pulsed arc plasma discharge method has the advantage of high deposition rate, chemicall stoichiometry equal to a bulk (target) material and possibility of in situ crystallization and low temperature process. The pulsed arc plasma discharge and the off-axis magnetron sputtering were applied to sputter YBa_2Cu_3O_<7-X> bulktargets and deposit YBaCuO thin films on MgO (100) and SrTiO_3 (100) substrates without heating. The plasma properties and the film characteristics were investigated to prepare the high-quality YBaCuO thin films. The films deposited by the pulsed arc plasma discharge method had almost stoichiometric composition. Optical emission spectroscopy was used to monitor the process plasma state and many spectral lines were i … More dentified. And the excitation temperature were estimated. Our experiments show that the pulsed arc plasma discharge method is simple, inexpensive and effective technique to fabricate YBaCuO superconducting thin films.A preparation of YBaCuO thin film on a flexible substrate with YSZ buffer layr by KrF pulsed laser deposition (PLD) was also investigated. The c-axis arraignment of the YBaCuO/YSZ/metal films was controlled by the orientation of the YSZ buffer layr. And laser-irradiated superconducting thin films were studied numerically by solving the one-dimensional heat conduction equation by means of the finite element method. Cubic BN films which might be coating films of YBaCuO thin films were prepared by pulsed YAG laser deposition. The electromagnetic noise caused by pulsed arc plasma discharge was also measured.We will get new good results from the pulsed process including pulsed arc plasma and pulsed laser. It might be very important to study the pulsed process scientifically and industrially. Less
期刊论文(33)
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会议论文
Y. Suda: "Development of a Pulsed Arc Plasma Process for Preparation of YBaCuO Thin Films" Proceedings of the 5th ACED-92. 157-160 (1992)
Y. Suda:“用于制备 YBaCuO 薄膜的脉冲电弧等离子体工艺的开发”第五届 ACED-92 论文集。
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須田 義昭: "パルスYAGレーザアブレッションによる窒化崩素薄膜作製と分光分析" 電気学会放電,誘電・電気材料合同研究会. ED-95-24. 81-90 (1995)
Yoshiaki Suda:“脉冲 YAG 激光烧蚀氮化氮薄膜的制备和光谱分析”IEEJ 放电、电介质和电气材料联合研究组 ED-95-90 (1995)。
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共 29 条
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    • 批准号:
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    • 项目类别:
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    • 资助金额:
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    • 项目类别:
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    • 批准号:
      11174193
    • 项目类别:
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    • 资助金额:
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    • 批准年份:
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    • 依托单位:
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