Development of Indoor Environmental Improvement System by Using Nano Structural High Sensitivity Thin Film Gas Sensor
Development of Indoor Environmental Improvement System by Using Nano Structural High Sensitivity Thin Film Gas Sensor
批准号:
14350153
负责人:
SUDA Yoshiaki
金额:
$4.74万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2005
中文摘要
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英文摘要
The purpose of this research is to combine the ozone deodorizations with the high sensitive and selective gas sensor and develop the indoor environmental improvement system.In this study, we prepared SnO_2, WO_3, ZnO, TiO_2 fims by pulsed Nd:YAG laser deposition (PLD) method. The surface morphology, crystalline structure, crystallographic orientation, composition ratio and bonding state of the films were analyzed by AFM, GXRD, FT-IR, XPS. Exprimental results suggest that the stoichimetric and crystalline SnO_2, WO_3, ZnO, TiO_2 flms can be prepared. We have succesfully deposited H_2 sensitive SnO_2-Pd thin films and NOx sensitive WO_3-Pd thin films using the new PLD In method combined with d.c. sputtering. Various dielectric thin films were prepared on the electrode surface of silent electrical discharge type ozonizer by sputtering method to get the highly effective ozonizer. The relation between the amount of the ozone generation and the discharge voltage and the dielectric thin film was clarified, and we succeeded in the development of highly effective ozonizer.In addition, the indoor environmental improvement system that combined a high sensitivity gas sensor, nitrogen dope TiO_2 photocatalyst, and highly effective ozonizer was developed.As mentioned above, the purpose of this research was achieved enough. In the future, an extremely new result is expected to be obtained by the development of the environmental improvement thin film material process using the pulsed laser and the development of the environmental improvement system using the ozonizer. It is very important to research the problem of this field aggressively from academic and an industrial viewpoint.A part of this research is published at a domestic and foreign science magazine and the academic society.The remainder of this research is scheduled to be made public one by one by the end of this year.
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F.Mitsugi: "Electrochromic WO_<3-*> and Colossal Magnetroresistive(La, Sr)MnO_3 Perovskite Oxide Thin Films by Pulsed Laser Deposition"Mat.Res.Soc.Symp.Proc.. 728巻. S3.3.1-S3.3.6 (2002)
F.Mitsugi:“通过脉冲激光沉积制备电致变色 WO_<3-*> 和巨大磁阻 (La, Sr)MnO_3 钙钛矿氧化物薄膜”Mat.Res.Soc.Symp.Proc.。第 728 卷。S3.3.1-S3。 3.6(2002)
DOI:
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发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
Preparation of silicon carbide nano-particles using a pulsed laser deposition method
脉冲激光沉积法制备碳化硅纳米颗粒
DOI:
--
发表时间:
2005
期刊:
Mater.Res.Soc. Vol.818
影响因子:
--
作者:
[H.Kawasaki, Y.Suda, T.Ueda, S.Nakashima]
通讯作者:
S.Nakashima
放電・プラズマを用いた電子工学公開講座I
使用放电和等离子体的电子工程公开讲座 I
DOI:
--
发表时间:
2004
期刊:
佐世保工業高等専門学校研究報告 第40号
影响因子:
--
作者:
[川崎仁晴, 茂木貴之, 熊井悠城, 須田義昭]
通讯作者:
須田義昭
Electro chromic WO_<3x> and Colossal Magnetroresistive (La, Sr) MnO_3 Perovskite Oxide Thin Films by Pulsed Laser Deposition
脉冲激光沉积电致变色WO_<3x>和巨磁阻(La,Sr)MnO_3钙钛矿氧化物薄膜
DOI:
--
发表时间:
2002
期刊:
Mat. Res. Soc. Symp. Proc. Vol.728
影响因子:
--
作者:
[F Mitsugi, E Hiraiwa, T Ikegami, K. Ebihara, Y. Suda]
通讯作者:
Y. Suda
DOI:
10.1016/s0169-4332(02)00333-1
发表时间:
2002-09-30
期刊:
APPLIED SURFACE SCIENCE
影响因子:
6.7
作者:
[Kawasaki, H, Namba, J, Ohshima, T]
通讯作者:
Ohshima, T
共 34 条
Fabrication of organic electro-luminescence thin films using low temperature electron ablation method
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批准号:22540510
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.75万
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财政年份:2010
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负责人:SUDA Yoshiaki
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依托单位:
Development of High Selective and High Sensitive Air Gas Sensor for Environmental Protection by PLD Method
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批准号:13555098
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$3.78万
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财政年份:2001
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负责人:SUDA Yoshiaki
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依托单位:
Development of Carbon Nitride (CN) Thin Film Preparation Process by Pulsed Laser Deposition
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批准号:10555108
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项目类别:Grant-in-Aid for Scientific Research (B).
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资助金额:$3.78万
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财政年份:1998
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负责人:SUDA Yoshiaki
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依托单位:
Development of cubic Boron Nitride (cBN) Thin Film Formation Process by Pulsed Laser Ablation
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批准号:07555104
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$2.3万
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财政年份:1995
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负责人:SUDA Yoshiaki
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依托单位:
A Study on Y Oxide High-Temperature Superconducting Thin Film Deposition by Pulsed Arc Plasma Discharges
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批准号:04555062
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$2.05万
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财政年份:1992
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负责人:SUDA Yoshiaki
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依托单位: