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Development of High Selective and High Sensitive Air Gas Sensor for Environmental Protection by PLD Method

Development of High Selective and High Sensitive Air Gas Sensor for Environmental Protection by PLD Method
PLD法开发高选择性、高灵敏度环保空气气体传感器
批准号:
13555098
负责人:
SUDA Yoshiaki
金额:
$3.78万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2003

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英文摘要
In this research, the gas sensors based on tin dioxide (SnO_2) and tungsten oxide (WO_3) thin films doped with different amount of palladium (Pd) and gold (Au) were deposited by the PLD method. The PLD method has become a widely used technique for the deposition of thin films during the past few years due to the advantages of a simple setup, wide ranging deposition conditions, wider choice of materials and higher instantaneous deposition rates. The following conclusions can be drawn from the results.1)We have successfully deposited SnO_2 and WO_3 thin films by the pulsed Nd:YAG (532nm) and pulsed KrF excimer (248nm) laser deposition methods. The surface morphology of the films was observed by a field-emission scanning microscope (FE-SEM) and an atomic force microscope (AFM). The crystalline structure and crystallographic orientation were characterized by GXRD and the composition of the films was measured by X-ray photbelectron spectroscopy (XPS).2)We have successfully prepared H_2 sens … More itive SnO_2-Pd thin films using the new PLD method combined with d.c. sputtering. The films have a polycrystalline structure which is suitable for gas sensing. The Pd atomic concentration of the SnO_2-Pd film depends on the Pd sputtering discharge power. The gas sensitivity of the SnO_2-Pd film prepared using new.PLD method was increased with the sputtering discharge power of Pd.3)We have synthesized NOx sensitive WO_3-Au and WO_3-Pd thin films using new PLD method. The gas sensitivity of the WO_3-Au thin film prepared using new PLD method for 200ppm NO_2 gas was increased with the sputtering power of Au at the range of 3.5 -5 W.4)We prepared CrC, TiC, CN, cBN, TaN films as a hard material and TiO_2 films as a photocatalyst by PLD method. These processes were compared with the SnO_2 and WO_3 thin film gas sensor preparation process.Our experiments show that our new PLD process is simple and effective technique to fabricate high-quality thin film gas sensors. It might be very important to study PLD process scientifically and industrially. Less
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会议论文
Y.Suda: "Crystalline Silicon Nitride Thin Films Grown by Pulsed YAG Laser Deposition"NanoStructured Phys.. Vol.12. 391-394 (1999)
Y.Suda:“脉冲 YAG 激光沉积生长的结晶氮化硅薄膜”NanoStructured Phys.. Vol.12。
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通讯作者:
H.Kawsaki: "NOx gas sensing properties of tungsten oxide thin films synthesized by pulsed laser deposition method"Applied Surface Science. Vol.197-198. 547-551 (2002)
H.Kawsaki:“脉冲激光沉积法合成的氧化钨薄膜的氮氧化物气体传感特性”应用表面科学。
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Y.Suda: "Characteristics of TiO_2 Thin Films as a Photocatalyst Using a Pulsed Laser Deposition Method"Journal of the Surface Finishing Society. Vol.54. 754-757 (2003)
Y.Suda:“使用脉冲激光沉积方法作为光催化剂的TiO_2薄膜的特性”表面处理学会杂志。
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H.Kawasaki: "Properties of metal doped tungsten oxide thin films for NOx gas sensors grown by PLD method combined with sputtering process"Sensors and Actuators B: Chemical. Vol.100. 266-269 (2004)
H.Kawasaki:“通过 PLD 方法结合溅射工艺生长的用于 NOx 气体传感器的金属掺杂氧化钨薄膜的特性”传感器和执行器 B:化学。
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