Secondary Cure of Laminated Patterns by Photofabrication
Secondary Cure of Laminated Patterns by Photofabrication
批准号:
07650153
负责人:
OTANI Toshikatsu
金额:
$1.54万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996
中文摘要
光加工技术是一种新型的图形加工技术。通过计算机控制的点激光束的三维扫描装置是可商购的。然而,由于激光束控制器和发生器的成本较高以及多层图案中形成层状表面,这些器件没有得到广泛应用。多层图案的侧面是层状的。为了抑制层状表面形成,将侧平面设置在玻璃容器中的光聚合物的底部,并再次暴露于UV射线。曝光后,层状表面的形成被明显抑制,表面粗糙度(Rmax)约为10 μ m。
英文摘要
Photofabrication is expected as a new technology for pattern manufacturing. Three dimensional plotter devices by computer controlled spot laser beam are available commercially. However, these devices are not widely applied due to the high cost of the laser beam controller and generator and the formation of a lamellar surface in multilayr patterns.A new device that is equipped with a mercury xenon lamp and an optical fiber was manufactured and multilayr patterns cured from the bottom by UV-rays of the device were fabricated. Side planes of the multilayr patterns were lamellar. In order to suppress lamellar surface formation, the side planes were set at the bottom of the phptopolymer in a glass vessel and re-exposed to UV-rays. After the exposure, lamellar sirface formation wassuppressed markedly and surface roughness (Rmax) was about 10 mum.
期刊论文(3)
专著(0)
科研奖励(0)
会议论文
大谷利勝,星野和義,他2名: "光ファイバで導光した紫外線による光造形法" 日本機械学会論文集.
Toshikatsu Otani、Kazuyoshi Hoshino 等 2 人:“利用光纤引导的紫外光进行立体光刻”,日本机械工程师学会会刊。
DOI:
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作者:
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通讯作者:
大谷利勝,星野和義,他: "光ファイバで導光した紫外線による光造形法" 日本機械学会論文集C編. 63・608(4月号 未定). (1997)
Toshikatsu Otani、Kazuyoshi Hoshino 等人:“利用光纤引导的紫外光进行立体光刻”,日本机械工程师学会会刊,C 版 63, 608(4 月号,未定)。
DOI:
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作者:
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通讯作者:
Toshikatsu OTANI,Kazuyoshi HOSHINO,Mitsuteru NOMOTO and Hayao EGUCHI: "Photofabrication by UV Ray Thought Optical Fiber" TRNSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS (C). 63 (April) -608. (1997)
Toshikatsu OTANI、Kazuyoshi HOSHINO、Mitsuteru NOMOTO 和 Hayao EGUCHI:“利用紫外线思想光纤进行光加工”日本机械工程师学会交易 (C)。
DOI:
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发表时间:
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影响因子:
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作者:
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通讯作者:
Manufacture of Metal Castings by Photofabricated Pattern
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批准号:14550728
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.86万
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财政年份:2002
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负责人:OTANI Toshikatsu
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依托单位:
Photo Polymer Patterns for Metal Mold.
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批准号:63550513
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.22万
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财政年份:1988
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负责人:OTANI Toshikatsu
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依托单位:
海外基金