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Modeling of Coulomb blockade devices and circuits with random structures

Modeling of Coulomb blockade devices and circuits with random structures
具有随机结构的库仑封锁装置和电路的建模
批准号:
08650413
负责人:
TOYABE Toru
金额:
$0.7万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1997

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中文摘要
翻译
由于库仑阻塞发生在电容非常小的隧道结中,利用这种现象的器件必须具有非常小的结构。因此,当今的实验装置往往具有随机结构。在本研究中,库仑阻塞器件的电路是在绝缘体薄膜上沉积的二维不规则的金属微粒阵列,最近的金属微粒对形成隧道结。由细小的金属颗粒形成的系统,圆点,模型化如下。假设网点系统具有规则的二维网格结构,并通过每个结点的电容和电阻的随机值来考虑随机性。在这些点的上方放置栅电极,并且在栅和点之间形成电容。这些值由COMPUTE中生成的规则随机数设置。在正统理论的基础上,通过一个用于电路模拟的程序,得到了每个隧道结的临界电荷。分析了规则电容和随机电容的不同情况对电特性的影响。
英文摘要
Since Coulomb blockade takes place in tunnel junctions with very small capacitance, devices utilizing this phenomenon must have very small structures. Accordingly, experimental devices of nowadays often have random structures. In this study Coulomb blockade device circuits with two-dimensional irregular array of fine metallic particles deposited on an insulator film.The nearest neighbor fine metallic particles pair forms a tunnel junction. A system which is formed from the fine metallic particles, dots, is modelled as follows. The system of the dots is assumed to have regular two-dimensional grid structures and the randomness is taken into account by the random values of capacitance and resistance of each junction. Above the dots a gate electrode is placed, and capacitances are formed between the gate and the dots. These values are set by regular random numbers generated in compute. Critical charge for each tunnel junction is obtained by a program to use in the circuit simulation based on the orthodox theory. The influences of the difference between the cases of regular and random capacitances on the electrical characteristics are esamined.
期刊论文(7)
专著(0)
科研奖励(0)
会议论文
Y.Matsumoto, T.Hanajiri, T.Toyabe and T.Sugano: ""Experimental Observation of Coulomb Staircase in Asymmetric Tunnel Barrier System"" International Electron Devices Meeting 1996 Tech.Digest. 429-432 (1996)
Y.Matsumoto、T.Hanajiri、T.Toyabe 和 T.Sugano:““非对称隧道势垒系统中库仑阶梯的实验观察””国际电子器件会议 1996 年技术文摘。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
松本、花尻、鳥谷部、菅野: "Experimental Observation of Coulomb Staircasein Asymmetric Tunnel Barrier System" International Electron Devices Meeting 1996 Tech.Digest. 429-432 (1996)
Matsumoto、Hanajiri、Toriyabe、Kanno:“库仑阶梯不对称隧道势垒系统的实验观察”国际电子器件会议 1996 年技术文摘 429-432 (1996)
DOI: --
发表时间:
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作者: []
通讯作者:
Y.Matsumoto, T.Hanajiri, T.Toyabe and T.Sugano: ""Advantages of the Asymmetric Tunnel Barrier for High-Density Integration of Single Electron Devices"" Jpn.J.Appl.Phys.vol.36. 4143-4146 (1997)
Y.Matsumoto、T.Hanajiri、T.Toyabe 和 T.Sugano:“非对称隧道势垒在单电子器件高密度集成中的优势”Jpn.J.Appl.Phys.vol.36。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
松本、花尻、鳥谷部、菅野: "Experimental Observation of Coulomb Staircase in Asymmetric Tunnel Barrier System" International Electron Devices Meeting 1996 Tech.Digest. 429-432 (1996)
Matsumoto、Hanajiri、Toriyabe、Kanno:“非对称隧道势垒系统中库仑阶梯的实验观察”国际电子器件会议 1996 Tech.Digest 429-432 (1996)
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
共 7 条
    Quantum Mechanical Simulation of Ultra Thin SOIMOSFETs
    • 批准号:
      14550332
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $0.7万
    • 财政年份:
      2002
    • 负责人:
      TOYABE Toru
    • 依托单位:
    海外基金