Optimization of preparation conditions for highly ordered structures of vapor-deposited organic thin films
Optimization of preparation conditions for highly ordered structures of vapor-deposited organic thin films
批准号:
18560009
负责人:
KUBONO Atsushi
金额:
$2.43万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2006
资助国家:
日本
项目状态:
已结题
起止时间:
2006 至 2007
中文摘要
高性能的有机薄膜需要对有机薄膜中分子的位置和取向进行三维(3D)调控。通过结合一维面外调节和二维面内对准,三维调节似乎是可行的。离面调控涉及作者首次论证的分子层外延方法,离面取向可以通过外电场诱导的界面各向异性、衬底晶体结构和衬底表面摩擦来控制。基于一种新的理论模型,从石英晶体微天平研究的角度探讨了这种特殊结构的形成机理。气相沉积技术可以产生具有垂直于衬底或横向于衬底的分子取向的有机薄膜,这取决于制备条件,例如衬底温度和沉积速率。不幸的是,其机制仍不清楚。在这项研究中,薄膜形成过程中的有机分子气相沉积已采用石英晶体微天平进行了研究。
英文摘要
Organic thin films with high performance require three-dimensional (3D) regulation of the position and the orientation of molecules in organic thin films. The 3D regulation appears to be feasible by combination of one-dimensional out-of-plane regulation and two-dimensional in-plane alignment. The out-of-plane regulation involves the molecular layer epitaxy method firstly demonstrated by the author, and the out-of-plane alignment can be controlled by the interfacial anisotropy induced by the external electric field, the substrate crystal structure and the rubbing of the substrate surface. The mechanism of the specific structure formation is discussed from the quartz crystal microbalance study on the basis of a novel theoretical model. The vapor deposition technique can produce organic thin films with a molecular orientation normal or lateral to the substrate, depending on the preparation condition, such as the substrate temperature and the deposition rate. Unfortunately, the mechanism is still unclear. In this study, thin film formation during vapor deposition of organic molecules has been investigated by using quartz crystal microbalance.
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DOI:
10.1063/1.1540231
发表时间:
2003-03
期刊:
Journal of Applied Physics
影响因子:
3.2
作者:
[K. Noda;K. Ishida;A. Kubono;T. Horiuchi;H. Yamada;K. Matsushige]
通讯作者:
K. Noda;K. Ishida;A. Kubono;T. Horiuchi;H. Yamada;K. Matsushige
有機エレクトロニクスにおける分子配向技術
有机电子学中的分子取向技术
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[K.Yamada, H.Nakamura, S.Matsushima, H.Yamane, T.Haishi, K.Kuamda, Hiroshi Kominami, 古南 博, Hiroshi Kominami, 古南 博, Hiroshi Kominami, Hiroshi Kominami, Hiroshi Kominami, S.Hashimoto, 橋本修一, S.Hashimoto, S.Hashimoto, S.Hashimoto, S.Hashimoto, S.Hashimoto, 池田 信之, 宮坂 力, 雉鳥 優二郎, 池田 信之, 手島健次郎, 池上和志, 池上 和志, 池上 和志, 宮坂 力, 雉鳥優二郎, Takurou N.Murakami, Nobuyuki Ikeda, 宮坂 力(共著)]
通讯作者:
宮坂 力(共著)
有機薄膜形成とデバイス応用展開
有机薄膜形成及器件应用开发
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[V.Singh, A.K. Thakur, S.S. Pandey, W. Takashima, K. Kaneto, 藤井彰彦]
通讯作者:
藤井彰彦
High piezoelectric activity in polyurea thin films prepared by vapor deposition polymerization
气相沉积聚合制备聚脲薄膜的高压电活性
DOI:
--
发表时间:
2008
期刊:
Jpn. J. Appl. Phys 47
影响因子:
--
作者:
[高野泰, 他, 久保野敦史]
通讯作者:
久保野敦史
蒸着重合法による高分子超格子薄膜の形成
气相沉积聚合法形成聚合物超晶格薄膜
DOI:
--
发表时间:
2006
期刊:
液晶 10
影响因子:
--
作者:
[高野泰, 他, 久保野敦史, 久保野 敦史, 久保野 敦史]
通讯作者:
久保野 敦史
共 7 条
Chiral molecular thin films prepared by vapor deposition polymerization with selective adsorption
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批准号:23651090
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.58万
-
财政年份:2011
-
负责人:KUBONO Atsushi
-
依托单位:
Three-Dimensional Molecular Alignment by the Use of Selective Adsorption on Solids
-
批准号:14550008
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$1.92万
-
财政年份:2002
-
负责人:KUBONO Atsushi
-
依托单位:
Structure and Opto-electric Properties of Polymeric Thin Films Prepared by Molecular Layr Epitaxy
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批准号:06650007
-
项目类别:Grant-in-Aid for General Scientific Research (C)
-
资助金额:$1.28万
-
财政年份:1994
-
负责人:KUBONO Atsushi
-
依托单位:
海外基金