Structure and Opto-electric Properties of Polymeric Thin Films Prepared by Molecular Layr Epitaxy
分子层外延制备聚合物薄膜的结构和光电性能
基本信息
- 批准号:06650007
- 负责人:
- 金额:$ 1.28万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for General Scientific Research (C)
- 财政年份:1994
- 资助国家:日本
- 起止时间:1994 至 1995
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Physical vapor deposition (PVD) and vapor deposition polymerization (VDP) are useful and promising methods for the preparation of organic and polymeric thin films with desired structures. Only a few studies, however, have been reported on the formation mechanisms of these thin films.Film formation mechanism during the alternating vapor deposition polymerization was studied by monitoring the change in the amount of adsorbate during the deposition. Azelaoyl dichloride (ADC) monomers can be chemisorbed onto the diaminoheptane (DAH) layr and form a mono-molecular layr with a normal molecular orientation. DAH monomers can be chemisorbed onto the ADC layr and form a multi-molecular layr on the surface of the chemisorbed DAH layr with the normal molecular orientation. Polyamide thin film with a layred structure like an Langmuir-Blodgett film was obtained by use of the alternating vapor deposition polymerization method, similar to the atomic layr epitaxy method.This research also aims to investigate the adsorption/desorption process in PVD and VDP.Observation using a quartz crystal microbalance (QCM) reveals that the first stage in thin film formation involves two types of adsorption which should be termed as physisorption and chemisorption. Analysis of the physisorption behavior of organic molecules gives the mean stay time and the adsorption energy of the molecules on the substrate.
物理气相沉积(PVD)和气相沉积聚合(VDP)是制备具有所需结构的有机和聚合物薄膜的有用和有前途的方法。然而,关于这些薄膜的形成机制的研究却很少,通过监测沉积过程中吸附质量的变化,研究了交替气相沉积聚合过程中的成膜机制。壬二酰氯(ADC)单体可以化学吸附到二氨基庚烷(DAH)层上并形成具有正常分子取向的单分子层。DAH单体可以化学吸附到ADC层上,并在化学吸附的DAH层的表面上形成具有正常分子取向的多分子层。采用交替气相沉积聚合法制备了具有层状结构的聚酰胺薄膜,本研究亦探讨PVD及VDP制程中之吸附/脱附过程,并以石英晶体微天平(QCM)观察。揭示了薄膜形成的第一阶段涉及两种类型的吸附,其应被称为物理吸附和化学吸附。分析了有机分子的物理吸附行为,给出了有机分子在基底上的平均停留时间和吸附能。
项目成果
期刊论文数量(8)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
久保野 敦史: "真空蒸着重合法におけるモノマー分子の付着特性及び分子配向" 電子情報通信学会技術研究報告. 94 (104). 63-68 (1994)
Atsushi Kubono:“真空蒸发聚合法中单体分子的粘附特性和分子取向”IEICE 技术报告 94(104)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
久保野 敦史: "真空蒸着重合法におけるモノマー分子の付着特性及び分子配向" 電子情報通信学会技術研究報告. 94(104). 63-68 (1994)
Atsushi Kubono:“真空蒸发聚合法中单体分子的粘合特性和分子取向”IEICE 技术报告 94(104)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
Atsushi KUBONO: "Adsorption and Orientation Characteristics of Monomer Molecules in Vapor Deposition Polymerization" IEICE Technical Report. 94(104). 63-68 (1994)
Atsushi KUBONO:“气相沉积聚合中单体分子的吸附和取向特性”IEICE 技术报告。
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- 影响因子:0
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KUBONO Atsushi其他文献
Control of Higher-Order Structures in Organic Thin Films
有机薄膜中高阶结构的控制
- DOI:
10.11618/adhesion.55.386 - 发表时间:
2019 - 期刊:
- 影响因子:0
- 作者:
MATSUBARA Ryosuke;KUBONO Atsushi - 通讯作者:
KUBONO Atsushi
Analysis of Initial Stage in Thin Film Growth of Organic Semiconductor Using Quartz Crystal Microbalance
利用石英晶体微天平分析有机半导体薄膜生长的初始阶段
- DOI:
10.1380/vss.62.498 - 发表时间:
2019 - 期刊:
- 影响因子:0
- 作者:
MATSUBARA Ryosuke;HANYU Daisuke;KUBONO Atsushi - 通讯作者:
KUBONO Atsushi
KUBONO Atsushi的其他文献
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{{ truncateString('KUBONO Atsushi', 18)}}的其他基金
Chiral molecular thin films prepared by vapor deposition polymerization with selective adsorption
选择性吸附气相沉积聚合制备手性分子薄膜
- 批准号:
23651090 - 财政年份:2011
- 资助金额:
$ 1.28万 - 项目类别:
Grant-in-Aid for Challenging Exploratory Research
Optimization of preparation conditions for highly ordered structures of vapor-deposited organic thin films
气相沉积有机薄膜高度有序结构制备条件优化
- 批准号:
18560009 - 财政年份:2006
- 资助金额:
$ 1.28万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Three-Dimensional Molecular Alignment by the Use of Selective Adsorption on Solids
利用固体上的选择性吸附进行三维分子排列
- 批准号:
14550008 - 财政年份:2002
- 资助金额:
$ 1.28万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
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