Super-Low-Operating-Voltage Dependable SRAM Using Total Variability Suppression Effects in FD-SOI
Super-Low-Operating-Voltage Dependable SRAM Using Total Variability Suppression Effects in FD-SOI
批准号:
20360161
负责人:
KAWAGUCHI Hiroshi
金额:
$11.73万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2011
中文摘要
我们提出了一种用于FD-SOI SRAM的衬底偏置控制方案,该方案抑制了管芯间的可变性,并提出了一种可以动态补偿其管芯内可变性的7 T/14 T(7-晶体管/14-晶体管)存储单元。所提出的衬底偏置控制电路自动检测管芯间阈值电压变化,然后最大化存储器单元的读/写裕度以提供衬底偏置。我们证实了一个150纳米486 kb的FD-SOI SRAM工作在0。42 V,其中FS转角可以与0.为了验证7 T/14 T可靠存储单元,我们制作了一个150 nm 576 kb FD-SOI SRAM。14 T可靠模式在14 T信元中分配一个比特,并改善其误码率。在我们的测量中,在14 T可靠模式下,最小保持电压和最小工作电压分别比7 T正常模式降低了150 mV和320 mV。
英文摘要
We proposed a substrate bias control scheme for an FD-SOI SRAM that suppresses inter-die variability and a 7T/14T(7-transistor/14-transistor) memory cell that can be dynamically compensate its intra-die variability. The proposed substrate bias control circuits detect inter-die threshold-voltage variation automatically, and then maximize read/write margins of memory cells to supply the substrate bias. We confirmed that a 150-nm 486-kb FD-SOI SRAM operates at 0. 42 V, in which an FS corner can be compared as much as 0. 14 V. For the 7T/14T dependable memory cell verification, we fabricated a 150-nm 576-kb FD-SOI SRAM. The 14T dependable mode allocates one bit in a 14T cell and improves its bit error rate. In our measurements, the minimum retention voltage and the minimum operating voltage were reduced by 150 mV and 320 mV in the 14T dependable mode over the 7T normal mode, respectively.
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DOI:
10.1109/irps.2011.5784596
发表时间:
2011-04
期刊:
2011 International Reliability Physics Symposium
影响因子:
--
作者:
[S. Yoshimoto;T. Amashita;S. Okumura;Kosuke Yamaguchi;M. Yoshimoto;H. Kawaguchi]
通讯作者:
S. Yoshimoto;T. Amashita;S. Okumura;Kosuke Yamaguchi;M. Yoshimoto;H. Kawaguchi
ビットエラー耐性及びソフトエラー耐性を備えたFD-SOI 7T/14T SRAM
FD-SOI 7T/14T SRAM,具有位错误容限和软错误容限功能
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[吉本秀輔, 天下卓郎, 奥村俊介, 山口幸介, 吉本雅彦, 川口博]
通讯作者:
川口博
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DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
チップ間ばらつき及びチップ内ばらつきを抑制する基板バイアス制御回路を備えた0. 42-V 576-Kb 0. 15-um FD-SOI 7T/14T SRAM
0. 42-V 576-Kb 0. 15-um FD-SOI 7T/14T SRAM,具有衬底偏置控制电路,可抑制芯片间和芯片内的变化
DOI:
--
发表时间:
2011
期刊:
電子情報通信学会技術研究報告
影响因子:
--
作者:
[吉本秀輔, 山口幸介, 奥村俊介, 吉本雅彦, 川口博]
通讯作者:
川口博
0.42-V 576-kb 0.15-um FD-SOT SRAM with 7T/14T Bit Cells and Substrate Bias Control Circuits for Intra-Die and Inter-Die Variability Compensation
具有 7T/14T 位单元和用于芯片内和芯片间变异补偿的基板偏置控制电路的 0.42V 576kb 0.15um FD-SOT SRAM
DOI:
--
发表时间:
2011
期刊:
Proceedings of Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits(EUROSOI)
影响因子:
--
作者:
[K.Yamaguchi, S.Okumura, M.Yoshimoto, H.Kawaguchi]
通讯作者:
H.Kawaguchi
共 28 条
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Mechanism of regulation of bone and cartilage metabolism by fibroblast growth factor-18 (FGF-18)
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Stimulatory effects of fibroblast growth facor-2 on bone formation and bone resorption
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Stereochemistny and Reactivity of the Complexes with Co-C bond Obtained by Photodecarboxylation
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Study on Mass Spectrometry for Nonmetallic Elements with Reduced-Pressure ICP
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Radio-Frequency Glow-Discharge Mass Spectrometry for Direct Analysis of Sintered Ceramics
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Mechanism of Coordination-site Exchange Reaction of the Cobalt(III) Complexes Containing Multidentate Ligands
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Mechanism of Interference Effects by Matrix Element and Elimination of the Effect in ICP Mass Spectrometry
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