Development of Reactive Plasma Spray Process for Fabrication of High Quality Aluminum Nitride Coating

氮化铝（AlN）具有高导热性和介电性。氮化铝是非常有用的，在几个应用，但它还没有开发出一个厚涂层工艺。本研究利用氮/氢等离子体与原料铝粉或氧化铝粉反应，成功地制备了氮化铝涂层。AlN涂层的晶体结构为立方结构，类似于氮氧化铝。结果表明，原料粉末在等离子体中飞行时的氮化过程是通过氮氧化物相进行的。

Aluminum nitride (AlN) possesses high thermal conductivity with dielectric property. AlN is very useful in several applications though it hasn't been developed a thick coating process. In this research, AlN coating was successfully fabricated by reactive plasma spray using nitrogen/hydrogen plasma for the reaction of feedstock aluminum or alumina powders. The crystal of the AlN coating was cubic structure which is similar to aluminum oxynitride. It became clear that the nitrding process of feedstock powder is through oxynitride phase during flight in the plasma.