Establishment of Formation Technology of Self-organization NanostructureTemplate by Sputtering

稳定形成纳米级周期性结构的材料和工艺技术是未来电子器件大规模生产的基础技术。因此，在本研究中，仅通过基于溅射的干法工艺来研究形成上述序列组织的技术。对于立方和/或四方系材料，建立了片状织构控制和几百纳米直径大颗粒组织的形成，并成功地通过氮气吸附或氮化工艺在Cu(001)/CuN表面周期性地形成了金属纳米岛的初始核序列。针对六角晶系材料，建立了c轴板织构控制和扩大晶粒度的工艺。

The material and process technology to stably form periodic structure with the nanometer order is the basic technology for the mass production of the future electronic devices. Therefore in this study, a technique to form the sequence organization mentioned above was investigated only by a sputtering-based dry process. About the cubic and/or tetragonal system materials, both of sheet texture control and formation of large grain microstructure in several hundred nano-meters diameter has been established and succeeded in the periodic initial nucleus sequence formation of the metal nano-islands on the Cu(001)/CuN surface by nitrogen gas adsorption or nitriding process. Furthermore about the hexagonal system materials, c-axis sheet texture control and enlarged grain size process has established.