Development of ultralow-loss glasses by controlling density fluctuations
Development of ultralow-loss glasses by controlling density fluctuations
批准号:
09355021
负责人:
IKUSHIMA Akira J.
金额:
$18.24万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
由于石英光纤中的光散射损耗主要是由玻璃化转变温度下的“冻结”密度起伏引起的,因此研究玻璃化转变温度附近的结构弛豫对于开发超低损耗石英玻璃是必要的。在本项目中,我们试图在包括玻璃转变温度在内的宽温度范围内测量石英玻璃的各种性质,并阐明了结构驰豫过程及其杂质效应如下:(1)OH或Cl增强了粘性流动所支配的α-驰豫过程,并产生了亚弛豫过程。(2)亚驰豫过程是由杂质扩散引起的局部结构变化。根据这些结果,我们建立了通过掺杂来控制结构驰豫的方法,这是开发超低损耗玻璃的基本技术。例如,仅在石英玻璃中添加10wt.ppm的Na2O,光散射损耗就降低了13%。该方法也可用于开发高抗紫外线、高耐热等高性能的石英玻璃。
英文摘要
Since light scattering loss in silica fiber is dominantly caused by "frozen-in" density fluctuations at the glass transition temperature, investigations of structural relaxation around the glass transition temperature are necessary for developing ultralow-loss silica glasses. In this project we tried to measure various properties of silica glasses over a wide-temperature range including the glass transition temperature, and have elucidated structural relaxation processes and their impurity effects as follows :(1)OH or Cl enhances the alpha -relaxation governed by viscous flow, and also generates a sub-relaxational process.(2)he sub-relaxational process is local structural change caused by impurity diffusion.From these results, we have established controlling the structural relaxation by impurity doping, which is a basic technology to develop ultralow-loss glasses. For example, the light scattering loss was reduced by 13% by the addition of only 10 wt.ppm Na_2O to silica glass. This method is also useful for developing silica glasses with high performances such as high UV-proof and high heat-proof properties.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
K.Saito, A.J.Ikushima, T.Ito, and A.Itoh: ""A New Method of Developing Ultralow-loss Glasses"" J.Appl.Phys.81. 7129-7134 (1997)
K.Saito、A.J.Ikushima、T.Ito 和 A.Itoh:““开发超低损耗玻璃的新方法””J.Appl.Phys.81。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
K.Saito and A.J.Ikushima: ""Development of a Wide-temperature Range VUV&UV Phospectrometer and Its Applications to Silica Glass"" J.Non-Cryst.Solids. (in print). (1999)
K.Saito 和 A.J.Ikushima:“宽温范围 VUV 的开发”
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
K.Saito and A.J.Ikushima: ""Structural Relaxation Enhanced by Impurities in Silica Glass"" AIP Conference Proceedings of Tohwa University International Symposium on "Slow Dynamics in Complex Systems". CP469. 507-512 (1999)
K.Saito 和 A.J.Ikushima:““二氧化硅玻璃中的杂质增强结构弛豫””东和大学“复杂系统中的慢动力学”国际研讨会 AIP 会议论文集。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
K.Saito and A.J.Ikushima: ""Reduction of Light-Scattering Loss in Silica Glass by the Structural Relaxation of "Frozen-in" Density Fluctuations"" Appl.Phys.Lett.70. 3504-3506 (1997)
K.Saito 和 A.J.Ikushima:“通过“冻结”密度波动的结构弛豫减少二氧化硅玻璃中的光散射损失”Appl.Phys.Lett.70。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
K.Saito, H.Kakiuchida, and A.J.Ikushima: ""Light Scattering Studies on the Glass Transition and the Structure in Silica Glass"" Jpn.J.Appl.Phys.Suppl.37-1. 32-35 (1998)
K.Saito、H.Kakiuchida 和 A.J.Ikushima:“二氧化硅玻璃中玻璃转变和结构的光散射研究”Jpn.J.Appl.Phys.Suppl.37-1。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
共 26 条
Development of silica glass for 157nm photolithography
-
批准号:12355025
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$12.88万
-
财政年份:2000
-
负责人:IKUSHIMA Akira J.
-
依托单位:
Study on structural relaxation in silica glass
-
批准号:09640408
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.56万
-
财政年份:1997
-
负责人:IKUSHIMA Akira J.
-
依托单位:
海外基金