Access to Nanoscience and Nanotechnology Equipment at Cardiff

这个免费使用纳米技术设施的项目，其中一些在英国是独一无二的，将由卡迪夫大学（CU）的制造工程中心（MEC）协调。该中心是由EPSRC资助的CU创新制造研究中心（CUIMRC）的一部分，在过去六年中一直是威尔士技术和工业合作（CETIC）的卓越中心，并且是DTI制造咨询服务（MAS）第一阶段的卓越制造中心。2001年，MEC启动了微纳米制造（MNM）研发计划，重点关注微纳米系统的先进制造研究，这是英国技术战略的优先领域之一。2005年，由于其在微纳米技术方面的研究成果和最先进的设施，该中心成为英国MNT网络的主要节点之一，并获得了DTI和威尔士议会政府350万美元的资本拨款。目前，MEC MNM项目包括2个国家和8个欧盟资助的研究项目，总预算超过1100万欧元。支撑MEC MNM项目的最先进的纳米科学和纳米技术设备将通过该项目提供给英国的学术界。该项目提供的研发服务将集中在制造、加工和表征工艺上，这些工艺在EPSRC最近进行的一项调查中被认为是需求最大的。特别是，以下服务将通过这个项目提供给英国学术界。-蔡司XB1540（50%备用容量）：2D和3D FIB纳米结构/光刻；同时扫描电镜FIB铣削；FIB辅助材料沉积；纳米器件、NEMS和纳米电子学的原型设计和小批量制造；显微镜样品的制备；原子探针分析样品的制备；TEM薄片的制备；高级成像和成分分析（EDX， EBSD和STEM）；制作2D和3D复制大师；半导体器件的故障分析与维修；高分辨率扫描电镜与FE发射器。- Imprio 55(60%)：在4 “和8 ”晶圆上进行纳米结构的紫外压印；批量制造规划纳米器件，如场效应管、传感器和光学元件；开发新的UV固化功能材料，如有机半导体。- XE-100(60%)：用于制造纳米器件的纳米光刻技术；AFM/STM成像表征纳米结构和纳米颗粒；纳米材料的结构和形貌表征。- MicroXAM-100-HR(60%)：垂直范围内纳米分辨率的3D剖面测量；材料失效分析；台阶高度从1nm到3mm的测量- SA/1m(60%)：用UV印迹母材制造镍纳米器件；热压印母版的制造。- microtechnik HEX03(60%)：在有机薄片上热压印纳米结构；批量制造平面纳米器件，如场效应管、传感器和光学元件；新型功能有机材料的表征，如有机半导体。微系统50(60%)：热塑性塑料中纳米结构的复制；用于纳米结构/纳米器件系列制造的新型功能热塑性塑料的表征。

This programme for free access to nanotechnology facilities, some of which unique in the UK, will be coordinated by the Manufacturing Engineering Centre (MEC) at Cardiff University (CU). The Centre is part of the CU Innovative Manufacturing Research Centre (CUIMRC) funded by the EPSRC, and has been a Centre of Excellence for Technology and Industrial Collaboration (CETIC) in Wales in the last six years and was a Centre for Manufacturing Excellence in Phase 1 of the DTI Manufacturing Advisory Service (MAS). In 2001, the MEC initiated a Micro and Nano Manufacturing (MNM) R&D programme with a focus on advanced manufacturing research for micro and nano-systems, one of the priority areas in the UK Technology Strategy. In 2005, in recognition of its research achievements and state-of-the-art facilities in Micro and Nano Technology the Centre became one of the main nodes within the UK MNT Network with the award of a 3.5M capital grant from the DTI and Welsh Assembly Government. Currently, the MEC MNM programme includes a portfolio of two National and eight EC funded research projects with a total budget in excess of 11M. The state-of-the-art nanoscience and nanotechnology equipment that underpins the MEC MNM programme will be made available through this programme to the academic community in the UK.The R&D services offered under this programme will focus on fabrication, processing and characterisation processes which were identified to have the greatest demand in NanoEquip2007, a recently conducted survey by the EPSRC.. In particular, the following services will be made available to the UK academic community through this programme.- Zeiss XB1540 (50% spare capacity): 2D and 3D FIB nanostructuring/lithography; FIB milling with simultaneous SEM; FIB assisted material deposition; prototyping and small batch fabrication of nanodevices, NEMS and nanoelectronics; preparation of microscopy samples; preparation of specimens for atom probe analysis; preparation of TEM lamellae; advanced imaging and compositional analysis (EDX, EBSD and STEM); fabrication of 2D and 3D replication masters; failure analysis and repair of semiconductor devices; high resolution SEM with FE emitter.- Imprio 55 (60%): UV imprinting of nanostructures on 4'' and 8'' wafers; batch fabrication of planner nanodevices, e.g. FETs, sensors and optical components; development of new UV curable functional materials, e.g. organic semiconductors.- XE-100 (60%): nanolithography for fabrication of nanodevices; AFM/STM imaging for characterisation of nanostructures and nanoparticles; structure and morphology characterisation of nanomaterials.- MicroXAM-100-HR (60%): 3D profiling measurements with nanometre resolution in the vertical range; failure analysis of materials; measurements of step heights from 1 nm to 3 mm.- SA/1m (60%): fabrication of nanodevices in nickel from UV imprinted masters; fabrication of masters for thermal imprinting.- Mikrotechnik HEX03 (60%): thermal imprinting of nanostructures on organic thin sheets; batch fabrication of planar nanodevices, e.g. FETs, sensors and optical components; characterisation of new functional organic materials, e.g. organic semiconductors.- Microsystem 50 (60%): replication of nanostructures in thermoplastics; characterisation of new functional thermoplastics for serial manufacture of nanostructures/nanodevices.