Nanoparticle and Element Distribution Studies of Ion Implantation Processes

离子注入改变衬底表面和亚表面微结构是材料和器件技术中的核心工艺。特别是，离子注入和退火序列的组合已知可以产生各种纳米结构，从几个原子的团簇到延伸的纳米颗粒，可以通过注入能量和退火参数来调节。现在，表征技术的进步使得在电子显微镜中观察和分析必要的退火步骤成为可能。通过像差校正技术的超高分辨率允许在高对比度情况下接近单原子能见度。技术上的另一个重大进步是在电子显微镜测角仪的特殊附件中应用了热处理和气体反应池。该项目将探索团簇和粒子形成的基础，探索团簇的横向分布及其与离子束参数的关系。将产生的材料和纳米结构的范围从金属(例如锌)在金属氧化物(例如氧化锌)上，到铁磁体(例如钴)，以及各向同性(二氧化硅)和单轴(A1203-0001)衬底的选择。

Ion implantation to modify the surface and sub-surface microstructure of substrates is a core process in materials and device technology. In particular the combination of ion implantation with annealing sequences is known to generate a variety of nanostructures, ranging from clusters of few atoms to extend nanoparticles, tunable by implantation energy and annealing parameters. Progress in characterisation techniques now makes it possible to observe and analyse the essential annealing step inside an electroni microscope. Ultra-high resolution through aberration correction techniques allows approaching single atom visibility for high contrast cases. Another major advance in technology is the aplication of heat treatments and gas reaction cells within special attachments to the TEM goniometer.The project will explore the basics of cluster and particle formation, explore the lateral distribution of clusters, and its relationship to the ion beam parameters. Materials and nanostructures which will be generated range from metals (e.g. Zn) over metal oxides (e.g. ZnO), to ferromagnets (e.g. Co), with a choice of isotropic (silica) and uni-axial (A1203-0001) substrates.