Time resolved optical emission spectroscopy

使用脉冲等离子体的真空技术被认为最适合于获得量身定制的纳米结构材料，预计将在许多领域取得重大进展，如光学和光子学、生物传感和成像、磁、光存储和纳米电子器件、航空电子设备的硬保护涂层、航空航天、医疗植入物、工具和化学机械抛光。在每个脉冲内形成的高密度等离子体使人能够获得瞬间非常高的等离子体密度，能够在气相中引发新的化学反应或在暴露的表面上发生物理反应，或者控制基片上的离子和高能凝聚粒子的能量和流量。在目前的拨款申请中，我们申请资助一台时间分辨光学发射光谱仪，在200-950纳米的大波长范围内，时间分辨率为5 ns。该仪器与现有的薄膜制备系统完全兼容，将使我们能够在基本等离子体工艺的基础上以及在包括脉冲磁控溅射(PMS)、高功率脉冲磁控溅射(HIPIMS)、等离子体增强化学气相沉积(PECVD)和脉冲激光烧蚀(PLA)在内的沉积技术的开发方面做出尖端研究。

Vacuum-based technologies using pulsed plasmas are considered most suitable for obtaining tailored nanostructured materials expected to lead to a significant progress in many areas such as optics and photonics, biosensing and imaging, magnetic, optical memory and nanoelectronics devices, hard protective coatings for avionics, aerospace, medical implants, tools, and chemical-mechanical polishing. High density plasmas formed within each individual pulse allow one to obtain momentarily very high plasma densities capable of initiating new chemical reactions in the gas phase or physical reactions at exposed surfaces, or of controlling the energy and flux of ions and energetic condensing particles at the substrates. In the present grant application, we seek funding for a time resolved optical emission spectrometer with a time resolution of 5 ns over a large wavelength range of 200-950 nm. This instrument, fully compatible with the existing film fabrication systems, will allow us to contribute cutting edge research in  fundamental understanding of the basic plasma processes as well as in the development of the deposition technologies including pulsed magnetron sputtering (PMS), high power impulse magnetron sputtering (HIPIMS), plasma enhanced chemical vapor deposition (PECVD), and pulsed laser ablation (PLA).