Ultra-high resolution depth profiling for nanomaterials and energy applications

功能材料及其界面的创新设计对于改进现有和新兴技术至关重要。例如，现在正在开发新型纳米材料，以最终取代晶体管、闪存和其他器件中的传统互补金属氧化物半导体（CMOS）技术。对改进的材料和器件的追求强烈依赖于现有的和新的工具，用于在原子尺度上探测它们的结构、组成和性质。虽然表征和计量方法已经取得了很大的进步，但许多领域将继续受到特征尺寸减小的挑战。在我们的小组中，我们专注于复杂材料及其界面的原子尺度行为。我们将采用生长纳米材料的新方法（离子注入，原子层沉积，分子束外延）和亚纳米深度分辨率（如中等能量离子散射）的表面表征，以及原子横向分辨率（扫描探针显微镜）。

The innovative design of functional materials and their interfaces is essential for improving existing and emerging technologies. For example, novel nanomaterials are now being developed to eventually replace conventional complementary metal-oxide-semiconductor (CMOS) technology in transistors, flash memory, and other devices. The pursuit of improved materials and devices strongly depends on existing and new tools for probing their structure, composition and properties at the atomic scale. Although characterization and metrology methods have made great advances, many areas will continue to be challenged by feature size reduction. In our group we focus on the atomic-scale behavior of complex materials and their interfaces. We will employ novel methods of growing nanomaterials (ion implantation, atomic layer deposition, molecular beam epitaxy) and surface characterization with sub-nanometer depth resolution (such as medium energy ion scattering), and the atomic lateral resolution (scanning probe microscopy).