Development of a large-area planar surface-wave plasma source with a cavity launcher driven by a 915 MHz UHF wave
Development of a large-area planar surface-wave plasma source with a cavity launcher driven by a 915 MHz UHF wave
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开发带有 915 MHz UHF 波驱动腔体发射器的大面积平面表面波等离子体源
DOI：
10.1088/0963-0252/22/2/025002
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发表时间：
2013-02
影响因子：
3.8
通讯作者：
Nagatsu, Masaaki
中科院分区：
文献类型：
--
作者：
Chang, Xijiang;Kunii, Kazuki;Liang, Rongqing;Nagatsu, Masaaki
研制了一台915 MHz超高频（UHF）波驱动的大面积平面表面波等离子体（SWP）源。为了避免使用大的，厚的电介质板作为真空窗口，我们提出了一个腔发射器由一个圆柱形腔与几个小的石英盘在底部。对三种不同位置的石英圆盘发射器进行了等离子体产生效率和电子密度空间分布的比较。在Ar气中，在8 Pa，入射功率0.5- 2.5kW的条件下，在25-30 cm的半径范围内获得了径向均匀度在±10%以内的大面积等离子体放电。最大电子密度和温度分别约为（0.95-1.1）× 1011 cm−3和1.9-2.0 eV，由位于腔发射器底部下方24 cm处的朗缪尔探针测量。使用Ar/NH3 SWP与最佳发射器，我们展示了大面积氨基聚氨酯片材的表面改性。实验结果表明，在约40 cm的半径上实现了均匀的氨基改性，该半径略大于电子密度分布的径向均匀性。
A large-area planar surface-wave plasma (SWP) source driven by a 915 MHz ultrahigh frequency (UHF) wave was developed. To avoid using large, thick dielectric plates as vacuum windows, we propose a cavity launcher consisting of a cylindrical cavity with several small quartz discs at the bottom. Three types of launchers with quartz discs located at different positions were tested to compare their plasma production efficiencies and spatial distributions of electron density. With the optimum launcher, large-area plasma discharges with a radial uniformity within ±10% were obtained in a radius of about 25–30 cm in Ar gas at 8 Pa for incident power in the range 0.5–2.5 kW. The maximum electron density and temperature were approximately (0.95–1.1) × 1011 cm−3 and 1.9–2.0 eV, respectively, as measured by a Langmuir probe located 24 cm below the bottom of the cavity launcher. Using an Ar/NH3 SWP with the optimum launcher, we demonstrated large-area amino-group surface modification of polyurethane sheets. Experimental results indicated that a uniform amino-group modification was achieved over a radius of approximately 40 cm, which is slightly larger than the radial uniformity of the electron density distribution.
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影响因子：
1.5
作者：
M. Nagatsu;I. Ghanashev;S. Morita;H. Sugai
通讯作者：
M. Nagatsu;I. Ghanashev;S. Morita;H. Sugai
影响因子：
1.5
作者：
S. Nakao;H. Sugai
通讯作者：
S. Nakao;H. Sugai
DOI：
10.1088/0022-3727/46/28/283001
发表时间：
2012-10
期刊：
Journal of Physics D: Applied Physics
影响因子：
--
作者：
V. Godyak
通讯作者：
V. Godyak
影响因子：
1.5
作者：
M. Nagatsu;Ge Xu;M. Yamage;M. Kanoh;Hideo Sugai Hideo Sugai-Hideo-Sugai
通讯作者：
M. Nagatsu;Ge Xu;M. Yamage;M. Kanoh;Hideo Sugai Hideo Sugai-Hideo-Sugai
DOI：
10.1088/0022-3727/24/7/001
发表时间：
1991-07
期刊：
Journal of Physics D
影响因子：
--
作者：
M. Moisan;Z. Zakrzewski
通讯作者：
M. Moisan;Z. Zakrzewski