3D active edge silicon sensors: Device processing, yield and QA for the ATLAS-IBL production
3D active edge silicon sensors: Device processing, yield and QA for the ATLAS-IBL production
复制标题
3D 有源边缘硅传感器:ATLAS-IBL 生产的设备处理、产量和质量保证
DOI:
10.1016/j.nima.2012.05.070
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发表时间:
2013
期刊:
影响因子:
--
通讯作者:
Da Vià C
中科院分区:
文献类型:
--
作者:
Da Vià C
3D silicon sensors, where plasma micromachining is used to etch deep narrow apertures in the silicon substrate to form electrodes of PIN junctions, were successfully manufactured in facilities in Europe and USA. In 2011 the technology underwent a qualification process to establish its maturity for a medium scale production for the construction of a pixel layer for vertex detection, the Insertable B-Layer (IBL) at the CERN-LHC ATLAS experiment. The IBL collaboration, following that recommendation from the review panel, decided to complete the production of planar and 3D sensors and endorsed the proposal to build enough modules for a mixed IBL sensor scenario where 25% of 3D modules populate the forward and backward part of each stave. The production of planar sensors will also allow coverage of 100% of the IBL, in case that option was required. This paper will describe the processing strategy which allowed successful 3D sensor production, some of the Quality Assurance (QA) tests performed during the pre-production phase and the production yield to date.
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影响因子:
1.8
作者:
Kenney, C;Parker, S;Storment, C
通讯作者:
Storment, C
DOI:
10.1109/nssmic.2011.6154334
发表时间:
2011
期刊:
2011 IEEE Nuclear Science Symposium Conference Record
影响因子:
--
作者:
A. Kok;M. Boscardin;G. Betta;C. D. Vià;G. Darbo;C. Fleta;T. Hansen;J. Hasi;C. Kenney;N. Lietaer;M. Lozano;Sherwood Parker;G. Pellegrini;A. Summanwar
通讯作者:
A. Summanwar
DOI:
10.1109/nssmic.2011.6154102
发表时间:
2011
期刊:
2011 IEEE Nuclear Science Symposium Conference Record
影响因子:
--
作者:
E. Vianello;A. Bagolini;P. Bellutti;M. Boscardin;G. Dalla Betta;G. Giacomini;C. Piemonte;M. Povoli;N. Zorzi
通讯作者:
N. Zorzi
DOI:
10.1016/j.nima.2009.03.049
发表时间:
2009
期刊:
Accelerators, Spectrometers, Detectors and Associated Equipment
影响因子:
--
作者:
Da Viá C
通讯作者:
Da Viá C
影响因子:
1.8
作者:
Kohler M
通讯作者:
Kohler M