Well Thickness Dependence of the Internal Quantum Efficiency and Carrier Concentration in GaN-Based Multiple Quantum Well Light-Emitting Diodes
Well Thickness Dependence of the Internal Quantum Efficiency and Carrier Concentration in GaN-Based Multiple Quantum Well Light-Emitting Diodes
复制标题
GaN基多量子阱发光二极管中内部量子效率和载流子浓度的阱厚度依赖性
DOI:
10.1007/s11664-015-4203-9
复制
发表时间:
2015
影响因子:
2.1
通讯作者:
LF Feng
中科院分区:
文献类型:
--
作者:
B Xu;D Li;CD Wang;LF Feng
The internal quantum efficiency (IQE) dependence characteristics of seven-well multiple quantum well (MQW) GaN-based light-emitting diodes (LEDs) on well thickness were obtained based on the rate equation without setting specific values for the coefficients. The IQE increased with increasing well thickness until the thickness reached 3.0 nm, where the IQE reached a maximum, and then decreased with further increases in well thickness. This IQE well thickness dependence is consistent with that of the measured light emission efficiency. In addition, using various values of the radiative recombination coefficientB, which contained the effects of the carrier density and polarization fields (and was thus dependent on the well thickness), we calculated the rate coefficients. The results indicate that the main factor that is limiting the well thickness dependence of the IQE is Shockley–Read–Hall (SRH) nonradiative recombination. Also, atB= 1010cm3s−1in a 3.0 nm thick well, the optimal values in the rate equation ofA, corresponding to the SRH nonradiative recombination, andC, corresponding to the carrier leakage (or Auger recombination), are 2.25 × 108s−1and 9.2 × 10−31cm6s−1, respectively. Also, at a given current, the maximum carrier concentration and the minimum radiative recombination lifetime were achieved using a 3.0 nm well thickness. Overall, for the seven-well MQW InGaN/GaN LEDs studied, the optimal well thickness was 3.0 nm.
登录
查看更多内容
影响因子:
3.2
作者:
Xing Li;S. Okur;Fan Zhang;V. Avrutin;Ü. Özgür;H. Morkoç;S. M. Hong;S. Yen;T. Hsu;A. Matulionis
通讯作者:
Xing Li;S. Okur;Fan Zhang;V. Avrutin;Ü. Özgür;H. Morkoç;S. M. Hong;S. Yen;T. Hsu;A. Matulionis
影响因子:
4
作者:
Li, Y.-L.;Huang, R.;Lai, Y.-H.
通讯作者:
Lai, Y.-H.
影响因子:
4
作者:
Shen, Y. C.;Mueller, G. O.;Krames, M. R.
通讯作者:
Krames, M. R.
影响因子:
3.3
作者:
Kioupakis, Emmanouil;Yan, Qimin;Van de Walle, Chris G.
通讯作者:
Van de Walle, Chris G.
影响因子:
4
作者:
Ryu, Han-Youl;Kim, Hyun-Sung;Shim, Jong-In
通讯作者:
Shim, Jong-In