Skin-on-a-Chip: Transepithelial Electrical Resistance and Extracellular Acidification Measurements through an Automated Air-Liquid Interface.
Skin-on-a-Chip: Transepithelial Electrical Resistance and Extracellular Acidification Measurements through an Automated Air-Liquid Interface.
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DOI:
10.3390/genes9020114
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发表时间:
2018-02-21
期刊:
影响因子:
3.5
通讯作者:
Wiest J
中科院分区:
文献类型:
--
作者:
Alexander FA;Eggert S;Wiest J
Skin is a critical organ that plays a crucial role in defending the internal organs of the body. For this reason, extensive work has gone into creating artificial models of the epidermis for in vitro skin toxicity tests. These tissue models, called reconstructed human epidermis (RhE), are used by researchers in the pharmaceutical, cosmetic, and environmental arenas to evaluate skin toxicity upon exposure to xenobiotics. Here, we present a label-free solution that leverages the use of the intelligent mobile lab for in vitro diagnostics (IMOLA-IVD), a noninvasive, sensor-based platform, to monitor the transepithelial electrical resistance (TEER) of RhE models and adherent cells cultured on porous membrane inserts. Murine fibroblasts cultured on polycarbonate membranes were first used as a test model to optimize procedures using a custom BioChip encapsulation design, as well as dual fluidic configurations, for continuous and automated perfusion of membrane-bound cultures. Extracellular acidification rate (EAR) and TEER of membrane-bound L929 cells were monitored. The developed protocol was then used to monitor the TEER of MatTek EpiDermTM RhE models over a period of 48 h. TEER and EAR measurements demonstrated that the designed system is capable of maintaining stable cultures on the chip, monitoring metabolic parameters, and revealing tissue breakdown over time.
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DOI:
10.1177/2211068214561025
发表时间:
2015-04
期刊:
Journal of laboratory automation
影响因子:
--
作者:
Srinivasan B;Kolli AR;Esch MB;Abaci HE;Shuler ML;Hickman JJ
通讯作者:
Hickman JJ
影响因子:
3.6
作者:
Sandby-Moller, J;Poulsen, T;Wulf, HC
通讯作者:
Wulf, HC
影响因子:
5.5
作者:
Moore, TL;Lunt, M;Herrick, AL
通讯作者:
Herrick, AL
影响因子:
3.2
作者:
Hoffmann, J;Heisler, E;Fuchs, HW
通讯作者:
Fuchs, HW
影响因子:
46.9
作者:
Bhatia, Sangeeta N.;Ingber, Donald E.
通讯作者:
Ingber, Donald E.