Micrograph and structure of CrN films prepared by plasma immersion ion implantation and deposition using HPPMS plasma source
Micrograph and structure of CrN films prepared by plasma immersion ion implantation and deposition using HPPMS plasma source
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使用 HPPMS 等离子体源进行等离子体浸没离子注入和沉积制备的 CrN 薄膜的显微照片和结构
DOI：
10.1016/j.surfcoat.2012.04.012
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发表时间：
2013-08
影响因子：
5.4
通讯作者：
Paul K. Chu
中科院分区：
文献类型：
--
作者：
Wu Zhongzhen;Tian Xiubo;Gong Chunzhi;Yang Shiqin;Paul K. Chu
为了获得优异的涂层与基体的结合力，PBII&D技术被提出并越来越广泛地应用于硬质涂层的制备。在金属等离子体源中，最近提出的一种基于高压等离子体质谱技术的金属等离子体源（HPPMS-PIID）具有很大的发展前景。本研究的目的是开发不同的金属等离子体源的HPPMS，FCA和DCMS的PBII&D技术在Si（100）和SU 201不锈钢基板上沉积的CrN薄膜的差异。与其他两种样品相比，基于HPPMS的样品呈现出致密的类蜂窝状表面和不连续的柱状结构。HPPMS等离子体源的高能离子注入和轰击可获得最高强度的CrN（200）择优取向、最好的结合力和硬度，但高能离子溅射使C含量略高。
In order to achieve excellent adhesion between coatings and substrates, PBII&D technique was proposed and used more and more widely to produce hard coatings. Among the metal plasma source, one based on HPPMS technique (HPPMS-PIID) proposed recently seems to have great prospects. The present study aims to develop the difference of CrN films deposited on Si (100) and SU201 stainless steel substrates with PBII&D technique using different metal plasma sources of HPPMS, FCA and DCMS. In contrast to the other two samples, the sample based on HPPMS appears to have dense knitting-like surface and discontinuous columnar structure. The highest intensity of CrN(200) preferential orientation, best adhesion and hardness is obtained by HPPMS plasma source for the highly energetic ion implantation and bombardment, but the C fraction is a little higher since the sputtering of highly energetic ions.
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影响因子：
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作者：
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通讯作者：
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影响因子：
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