Fundamental Studies of Radiofrequency Gas Discharges for Plasma Processing

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The fundamentals of plasma etching are not understood in general, as so many different processes occur simultaneously, including substantial electrical interactions. This study will use powerful diagnostics resources (spectroscopy of emission, fluorescence, optogalvanic methods) to elucidate the role of negative charges, of the rf discharge geometry and of the operating variables. With such knowledge, it will become practical to devise predictive, quantitative methods for use in the development of new plasma processes.