System and Control Analysis of Low Pressure Plasma Deposition

低压等离子体沉积系统及控制分析

基本信息

  • 批准号:
    8909997
  • 负责人:
  • 金额:
    --
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    1989
  • 资助国家:
    美国
  • 起止时间:
    1989-08-01 至 1992-07-31
  • 项目状态:
    已结题

项目摘要

A systems based approach will be used for improving low pressure plasma deposition (LPPD) processes. LPPD enables production of engineering materials of fine microstructure, high density, in useful engineering shapes. Important applications include production of metal matrix composites and alloy materials used in gas turbines and aircraft engines. Currently, these processes are operated in an empirically determined feedforward fashion. This poses limits on the achievable material quality and on the speed the process can be adapted to meet new manufacturing and materials requirements. This study will determine the important process characteristics needed to develop alternative controller design and will also aid in optimizing the operating regime and system design. Low order models (LOMs) that capture the dominant system dynamics will be developed to reveal the important system relationships. The process models will be analyzed to obtain an explicit description of the process constraints for LPPD.The LOMs will be developed from lumped and parametric representations of the process physics and by reduction of existing high order models. Analysis results will be confirmed by comparison to existing high order modelling and experimental studies.
基于系统的方法将用于改进低压等离子体沉积(LPPD)工艺。LPPD能够生产具有精细微观结构、高密度、有用的工程形状的工程材料。重要的应用包括生产用于燃气涡轮机和飞机发动机的金属基复合材料和合金材料。目前,这些过程以经验确定的前馈方式操作。这对可实现的材料质量和工艺适应新的制造和材料要求的速度造成了限制。这项研究将确定开发替代控制器设计所需的重要过程特性,并有助于优化操作制度和系统设计。低阶模型(LOMs),捕捉主导系统动态将被开发,以揭示重要的系统关系。将分析过程模型以获得LPPD的过程约束的显式描述。将从过程物理的集总和参数表示以及通过减少现有高阶模型来开发LOM。分析结果将通过与现有的高阶建模和实验研究进行比较来证实。

项目成果

期刊论文数量(0)
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Michael Gevelber其他文献

Solidification modeling of plasma sprayed TBC: Analysis of remelt and multiple length scales of rough substrates
  • DOI:
    10.1361/105996302770348934
  • 发表时间:
    2002-06-01
  • 期刊:
  • 影响因子:
    3.300
  • 作者:
    Donald E. Wroblewski;Rajesh Khare;Michael Gevelber
  • 通讯作者:
    Michael Gevelber
Towards closed-loop control of CVD coating microstructure
  • DOI:
    10.1016/0921-5093(95)10092-x
  • 发表时间:
    1996-05-01
  • 期刊:
  • 影响因子:
  • 作者:
    Michael Gevelber;Manuel Toledo-Quin˜ones;Michael Bufano
  • 通讯作者:
    Michael Bufano

Michael Gevelber的其他文献

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{{ truncateString('Michael Gevelber', 18)}}的其他基金

Real-Time Control for Engineering Electrospun Nanofiber Diameter Distributions for Advanced Applications
实时控制工程静电纺纳米纤维直径分布的高级应用
  • 批准号:
    0826106
  • 财政年份:
    2008
  • 资助金额:
    --
  • 项目类别:
    Standard Grant
GOALI: Engineering Coating Microstructure Through Advanced Plasma Spray Processing: Fuel Cell and Thermal Barrier Applications
GOALI:通过先进等离子喷涂处理工程涂层微观结构:燃料电池和热障应用
  • 批准号:
    0300484
  • 财政年份:
    2003
  • 资助金额:
    --
  • 项目类别:
    Standard Grant
Advanced Instrumentation Development for Research and Education on Plasma Coating Crack Formation Fundamentals and Control
用于等离子涂层裂纹形成基础和控制研究和教育的先进仪器开发
  • 批准号:
    0114186
  • 财政年份:
    2001
  • 资助金额:
    --
  • 项目类别:
    Standard Grant
Control Development and Modelling for Enhanced Crystal Growth: Application to Novel New Technologies and Extenstion of Conventional Capabilities
增强晶体生长的控制开发和建模:新技术的应用和传统能力的扩展
  • 批准号:
    0100310
  • 财政年份:
    2001
  • 资助金额:
    --
  • 项目类别:
    Standard Grant
Integrated Plasma Deposition Processing for Advanced Controlof Coating Structure
用于先进控制涂层结构的集成等离子体沉积处理
  • 批准号:
    9713957
  • 财政年份:
    1997
  • 资助金额:
    --
  • 项目类别:
    Continuing Grant
Accelerated MS in Manufacturing for Practicing Engineers
为执业工程师提供制造加速硕士学位
  • 批准号:
    9411525
  • 财政年份:
    1994
  • 资助金额:
    --
  • 项目类别:
    Standard Grant
Real Time Control of Engineered Coating Microstructure by Chemical Vapor Desposition (CVD)
通过化学气相沉积 (CVD) 实时控制工程涂层微观结构
  • 批准号:
    9400328
  • 财政年份:
    1994
  • 资助金额:
    --
  • 项目类别:
    Continuing grant
Modelling and Control of Plasma Deposition for Enhanced Materials Production
用于增强材料生产的等离子体沉积的建模和控制
  • 批准号:
    9300614
  • 财政年份:
    1993
  • 资助金额:
    --
  • 项目类别:
    Continuing grant

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