Modelling and Control of Plasma Deposition for Enhanced Materials Production

用于增强材料生产的等离子体沉积的建模和控制

• 批准号: 9300614
• 负责人: Michael Gevelber
• 金额: --
• 依托单位: Trustees of Boston University
• 依托单位国家: 美国
• 项目类别: Continuing grant
• 财政年份: 1993
• 资助国家: 美国
• 起止时间: 1993-05-01 至 1997-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9300614&HistoricalAwards=false
• 关键词: Modelling; Control; Plasma; Deposition; Enhanced

The objective of the research is to develop a closed loop control system for induction plasma deposition in order to improve manufactured material quality and also expand the processing capabilities. Such a system will also provide new capabilities to examine the structure/performance relations achievable by plasma deposition. The research is focused on the following areas: 1) experimental verification of a low order model of the process and its refinement, 2) development of control structure, control implementation, and preliminary processing/materials property studies, and 3) extension to related systems. Plasma torches are used to melt and accelerate metallic and/or ceramic particles in order to form dense coatings at high production rates. Plasma deposition is used in a variety of different applications including corrosion, thermal and wear resistance coatings, near net shape manufacture, and production of metal matrix composites. Successful modeling and control of the process will reduce variations in material quality in induction plasma deposition processes.

本研究的目的是开发一个闭环控制系统的感应等离子体沉积，以提高制造材料的质量，并扩大处理能力。这样的系统还将提供新的能力来检查等离子体沉积可实现的结构/性能关系。研究的重点是以下几个方面：1）实验验证的低阶模型的过程和它的细化，2）控制结构的发展，控制实施，和初步的处理/材料性能的研究，和3）扩展到相关的系统。等离子体炬用于熔化和加速金属和/或陶瓷颗粒，以便以高生产率形成致密涂层。等离子体沉积用于各种不同的应用，包括耐腐蚀、耐热和耐磨涂层、近净成形制造和金属基复合材料的生产。成功的建模和过程控制将减少感应等离子体沉积过程中材料质量的变化。