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Modelling and Control of Plasma Deposition for Enhanced Materials Production

Modelling and Control of Plasma Deposition for Enhanced Materials Production
用于增强材料生产的等离子体沉积的建模和控制
批准号:
9300614
负责人:
Michael Gevelber
金额:
$0.0万
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1993
资助国家:
美国
项目状态:
已结题
起止时间:
1993-05-01 至 1997-04-30

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中文摘要
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英文摘要
The objective of the research is to develop a closed loop control system for induction plasma deposition in order to improve manufactured material quality and also expand the processing capabilities. Such a system will also provide new capabilities to examine the structure/performance relations achievable by plasma deposition. The research is focused on the following areas: 1) experimental verification of a low order model of the process and its refinement, 2) development of control structure, control implementation, and preliminary processing/materials property studies, and 3) extension to related systems. Plasma torches are used to melt and accelerate metallic and/or ceramic particles in order to form dense coatings at high production rates. Plasma deposition is used in a variety of different applications including corrosion, thermal and wear resistance coatings, near net shape manufacture, and production of metal matrix composites. Successful modeling and control of the process will reduce variations in material quality in induction plasma deposition processes.
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Real-Time Control for Engineering Electrospun Nanofiber Diameter Distributions for Advanced Applications
  • 批准号:
    0826106
  • 项目类别:
    Standard Grant
  • 资助金额:
    $21.5万
  • 财政年份:
    2008
  • 负责人:
    Michael Gevelber
  • 依托单位:
GOALI: Engineering Coating Microstructure Through Advanced Plasma Spray Processing: Fuel Cell and Thermal Barrier Applications
  • 批准号:
    0300484
  • 项目类别:
    Standard Grant
  • 资助金额:
    $39.9万
  • 财政年份:
    2003
  • 负责人:
    Michael Gevelber
  • 依托单位:
Advanced Instrumentation Development for Research and Education on Plasma Coating Crack Formation Fundamentals and Control
  • 批准号:
    0114186
  • 项目类别:
    Standard Grant
  • 资助金额:
    $8.89万
  • 财政年份:
    2001
  • 负责人:
    Michael Gevelber
  • 依托单位:
Control Development and Modelling for Enhanced Crystal Growth: Application to Novel New Technologies and Extenstion of Conventional Capabilities
  • 批准号:
    0100310
  • 项目类别:
    Standard Grant
  • 资助金额:
    $27.0万
  • 财政年份:
    2001
  • 负责人:
    Michael Gevelber
  • 依托单位:
国内基金
海外基金
Cortical control of internal state in the insular cortex-claustrum region