Real Time Control of Engineered Coating Microstructure by Chemical Vapor Desposition (CVD)
Real Time Control of Engineered Coating Microstructure by Chemical Vapor Desposition (CVD)
批准号:
9400328
负责人:
Michael Gevelber
金额:
$0.0万
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1994
资助国家:
美国
项目状态:
已结题
起止时间:
1994-08-01 至 1998-07-31
中文摘要
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英文摘要
9400328 Gevelber The award is for research directed at improving the ability to fabricate engineered coatings through the development of a real- time control system for chemical vapor deposition. Such coatings are currently used to improve surface properties such as thermal shock resistance, corrosion, wear, and oxidation resistance. Real time measurement of the growth process is the basis for improved control of the coating morphology. The current practice of maintaining process input variables such as gas flow rates and temperatures at empirically determined setpoints does not ensure achievement of the desired morphology and requires extensive trial and error each time the equipment or the process is changed. The proposal research involves modeling the nucleation/growth kinetics, designing and implementing an appropriate control structure in-situ sensors, and experimental verification of the approach. The work is expected to result in expanded processing capabilities in chemical vapor deposition coating applications in the aerospace and machine tooling industries. The work is also likely to benefit a broader variety of advanced materials processing technologies by formulating a methodology for better closed loop control of such process.
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Real-Time Control for Engineering Electrospun Nanofiber Diameter Distributions for Advanced Applications
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批准号:0826106
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项目类别:Standard Grant
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资助金额:$21.5万
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财政年份:2008
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负责人:Michael Gevelber
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依托单位:
GOALI: Engineering Coating Microstructure Through Advanced Plasma Spray Processing: Fuel Cell and Thermal Barrier Applications
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批准号:0300484
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资助金额:$39.9万
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财政年份:2003
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负责人:Michael Gevelber
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依托单位:
Advanced Instrumentation Development for Research and Education on Plasma Coating Crack Formation Fundamentals and Control
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批准号:0114186
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项目类别:Standard Grant
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资助金额:$8.89万
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财政年份:2001
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负责人:Michael Gevelber
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依托单位:
Control Development and Modelling for Enhanced Crystal Growth: Application to Novel New Technologies and Extenstion of Conventional Capabilities
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批准号:0100310
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项目类别:Standard Grant
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资助金额:$27.0万
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财政年份:2001
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负责人:Michael Gevelber
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依托单位:
Integrated Plasma Deposition Processing for Advanced Controlof Coating Structure
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批准号:9713957
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项目类别:Continuing Grant
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资助金额:$36.42万
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财政年份:1997
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Accelerated MS in Manufacturing for Practicing Engineers
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批准号:9411525
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资助金额:$59.2万
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财政年份:1994
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负责人:Michael Gevelber
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依托单位:
Modelling and Control of Plasma Deposition for Enhanced Materials Production
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批准号:9300614
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1993
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负责人:Michael Gevelber
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依托单位:
System and Control Analysis of Low Pressure Plasma Deposition
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批准号:8909997
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1989
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负责人:Michael Gevelber
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依托单位:
国内基金
海外基金
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