Integrated Plasma Deposition Processing for Advanced Controlof Coating Structure
Integrated Plasma Deposition Processing for Advanced Controlof Coating Structure
批准号:
9713957
负责人:
Michael Gevelber
金额:
$36.42万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1997
资助国家:
美国
项目状态:
已结题
起止时间:
1997-09-01 至 2002-08-31
中文摘要
该研究项目旨在开发一种先进的控制系统所需的知识基础,该系统可以更直接地控制集成等离子沉积过程中的涂层性能。研究的主要领域包括:(a)建立适当的模型,以深入了解可操作输入、过程变量和最终材料属性之间的关系;(b)开发适当的传感器、控制策略和算法;(c)实验分析,以确认控制策略的模型和基本假设。这项研究在理论与实验之间取得了平衡。这项研究工作将集中于与两个工业集团建立联系:寻求开发新涂料的最终用户集团和设备供应商集团。虽然设备供应商历来不是开发改进的等离子沉积控制系统的领导者,但寻求这种合作努力将有助于促进新技术向工业的扩散。这项工作是与工业界密切合作,以确保研究集中在与工业有关的问题上,并利用工业上最先进的等离子沉积设备共同进行实验。
英文摘要
This research project is to develop the knowledge base required for implementing an advanced control system that more directly controls coating properties in the integrated plasma deposition processing. The primary areas of the research include: (a) developing appropriate models that yield insight into the relation of manipulatable inputs, process variables, and resulting material attributes, (b) development of appropriate sensors, control strategies and algorithms, and (c) experimental analysis to confirm models and fundamental assumptions of the control strategy. The research has a balance between theory and experimentation. This research effort will be focused on making connections to two industrial groups: that of the end-user who seek to develop new coatings, and that of the equipment vendor. While equipment vendors have not historically been leaders at developing improved control systems for plasma deposition, seeking such collaborative efforts will help promote diffusion of new technology to industry. The work is in close collaboration with industry to ensure the research is focused on issues relevant to industry and to jointly conduct experiments utilizing an industrial state-of-the-art plasma deposition facility.
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会议论文
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依托单位: