Integrated Plasma Deposition Processing for Advanced Controlof Coating Structure

用于先进控制涂层结构的集成等离子体沉积处理

• 批准号: 9713957
• 负责人: Michael Gevelber
• 金额: $ 36.42万
• 依托单位: Trustees of Boston University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1997
• 资助国家: 美国
• 起止时间: 1997-09-01 至 2002-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9713957&HistoricalAwards=false
• 关键词: Integrated; Plasma; Deposition; Processing; Advanced

This research project is to develop the knowledge base required for implementing an advanced control system that more directly controls coating properties in the integrated plasma deposition processing. The primary areas of the research include: (a) developing appropriate models that yield insight into the relation of manipulatable inputs, process variables, and resulting material attributes, (b) development of appropriate sensors, control strategies and algorithms, and (c) experimental analysis to confirm models and fundamental assumptions of the control strategy. The research has a balance between theory and experimentation. This research effort will be focused on making connections to two industrial groups: that of the end-user who seek to develop new coatings, and that of the equipment vendor. While equipment vendors have not historically been leaders at developing improved control systems for plasma deposition, seeking such collaborative efforts will help promote diffusion of new technology to industry. The work is in close collaboration with industry to ensure the research is focused on issues relevant to industry and to jointly conduct experiments utilizing an industrial state-of-the-art plasma deposition facility.

该研究项目旨在开发实施先进控制系统所需的知识库，该系统可以更直接地控制集成等离子体沉积处理中的涂层性能。 研究的主要领域包括：（a）开发适当的模型，深入了解可操纵输入、过程变量和最终材料属性的关系，（b）开发适当的传感器、控制策略和算法，以及（c）实验分析以确认模型和控制策略的基本假设。 该研究在理论和实验之间取得了平衡。 这项研究工作将集中于与两个工业团体建立联系：寻求开发新涂料的最终用户团体和设备供应商团体。 虽然设备供应商历来并不是开发改进的等离子体沉积控制系统的领导者，但寻求这种协作努力将有助于促进新技术向行业的传播。 这项工作与工业界密切合作，以确保研究重点关注与工业相关的问题，并利用工业最先进的等离子体沉积设施联合进行实验。