Integrated Plasma Deposition Processing for Advanced Controlof Coating Structure

本研究项目旨在开发实施先进控制系统所需的知识库，该系统可更直接地控制集成等离子体沉积工艺中的涂层性能。 研究的主要领域包括：（a）开发适当的模型，深入了解可操纵输入，过程变量和所得材料属性的关系，（B）开发适当的传感器，控制策略和算法，以及（c）实验分析，以确认模型和控制策略的基本假设。 本研究在理论和实验之间取得了平衡。 这项研究工作的重点是与两个工业集团建立联系：寻求开发新涂料的最终用户和设备供应商。 虽然设备供应商在历史上并不是开发等离子体沉积改进控制系统的领导者，但寻求这种合作将有助于促进新技术在工业中的传播。 这项工作与工业界密切合作，以确保研究重点放在与工业相关的问题上，并利用工业上最先进的等离子体沉积设施联合进行实验。

This research project is to develop the knowledge base required for implementing an advanced control system that more directly controls coating properties in the integrated plasma deposition processing. The primary areas of the research include: (a) developing appropriate models that yield insight into the relation of manipulatable inputs, process variables, and resulting material attributes, (b) development of appropriate sensors, control strategies and algorithms, and (c) experimental analysis to confirm models and fundamental assumptions of the control strategy. The research has a balance between theory and experimentation. This research effort will be focused on making connections to two industrial groups: that of the end-user who seek to develop new coatings, and that of the equipment vendor. While equipment vendors have not historically been leaders at developing improved control systems for plasma deposition, seeking such collaborative efforts will help promote diffusion of new technology to industry. The work is in close collaboration with industry to ensure the research is focused on issues relevant to industry and to jointly conduct experiments utilizing an industrial state-of-the-art plasma deposition facility.