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Research Initiation Award: Research in Nonlinear Control

Research Initiation Award: Research in Nonlinear Control
研究启动奖:非线性控制研究
批准号:
9009958
负责人:
John Hauser
金额:
$4.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-07-01 至 1992-06-30

项目摘要

项目成果

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中文摘要
翻译
非线性控制理论的最新发展以及计算技术的重大进步使控制系统设计的新时代成为可能。利用这些进步,我们寻求扩大理论的适用性,以实现实用设计方法的最终目标。利用微分几何、中心流形和奇异摄动的理论工具,借助于强大的图形和符号计算工具,我们将研究:具有期望正则性条件的非线性系统的O输入-输出近似;系统摄动对MIMO非线性系统结构的影响。更好地了解这些领域将对高性能非线性控制系统的理论认识和实际设计做出重大贡献。
英文摘要
Recent developments in nonlinear control theory coupled with significant advances in computing technology have made possible a new era of control systems design. Availing ourselves of these advances, we seek to expand the applicability of the theory toward an eventual goal of a practicable design methodology. Using theoretical tools from differential geometry, center manifolds, and singular perturbations and aided by powerful graphics and symbolic computational tools, we will investigate: o input-output approximations of nonlinear systems by nonlinear systems possessing desired regularity conditions, and o the effect of system perturbations on the structure of MIMO nonlinear systems. A better understanding of these areas will make a significant contribution to the theoretical understanding and practical design of high performance nonlinear control systems.
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CPS: Synergy: Collaborative Research: Semantics of Optimization for Real Time Intelligent Embedded Systems (SORTIES)
  • 批准号:
    1446812
  • 项目类别:
    Standard Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    2015
  • 负责人:
    John Hauser
  • 依托单位:
Enhanced Single Wafer Research Cluster for Advanced Electronic Materials Processing
  • 批准号:
    9872794
  • 项目类别:
    Standard Grant
  • 资助金额:
    $37.46万
  • 财政年份:
    1998
  • 负责人:
    John Hauser
  • 依托单位:
Chemical Composition Profiling of Ultra-thin Silcon Dioxide/Silicon Nitride and Other Alternative Multilayer Dielectrics for Advanced Microelectronic Devices
  • 批准号:
    9720424
  • 项目类别:
    Standard Grant
  • 资助金额:
    $45.4万
  • 财政年份:
    1997
  • 负责人:
    John Hauser
  • 依托单位:
MRI: Acquisition of Chemical Mechanical Polishing System for Semiconductor Research
  • 批准号:
    9724387
  • 项目类别:
    Standard Grant
  • 资助金额:
    $37.0万
  • 财政年份:
    1997
  • 负责人:
    John Hauser
  • 依托单位:
海外基金