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Research Initiation Award: Research in Nonlinear Control

Research Initiation Award: Research in Nonlinear Control
研究启动奖:非线性控制研究
批准号:
9009958
负责人:
John Hauser
金额:
$4.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-07-01 至 1992-06-30

项目摘要

项目成果

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中文摘要
翻译
非线性控制的最新进展 理论加上重大进展, 计算机技术使一种新的 控制系统设计的时代。 援用 在这些进步中,我们寻求扩大 理论的适用性, 可行设计的最终目标 方法论 使用理论工具, 微分几何,中心流形, 奇异摄动和辅助强大的 图形和符号计算工具,我们 将调查: O 输入输出近似 非线性系统 具有期望正则性的系统 条件和 O 系统扰动对 MIMO非线性结构 系统. 更好地了解这些领域将 大大有助于 理论认识与实践设计 高性能非线性控制系统。
英文摘要
Recent developments in nonlinear control theory coupled with significant advances in computing technology have made possible a new era of control systems design. Availing ourselves of these advances, we seek to expand the applicability of the theory toward an eventual goal of a practicable design methodology. Using theoretical tools from differential geometry, center manifolds, and singular perturbations and aided by powerful graphics and symbolic computational tools, we will investigate: o input-output approximations of nonlinear systems by nonlinear systems possessing desired regularity conditions, and o the effect of system perturbations on the structure of MIMO nonlinear systems. A better understanding of these areas will make a significant contribution to the theoretical understanding and practical design of high performance nonlinear control systems.
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CPS: Synergy: Collaborative Research: Semantics of Optimization for Real Time Intelligent Embedded Systems (SORTIES)
  • 批准号:
    1446812
  • 项目类别:
    Standard Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    2015
  • 负责人:
    John Hauser
  • 依托单位:
Enhanced Single Wafer Research Cluster for Advanced Electronic Materials Processing
  • 批准号:
    9872794
  • 项目类别:
    Standard Grant
  • 资助金额:
    $37.46万
  • 财政年份:
    1998
  • 负责人:
    John Hauser
  • 依托单位:
Chemical Composition Profiling of Ultra-thin Silcon Dioxide/Silicon Nitride and Other Alternative Multilayer Dielectrics for Advanced Microelectronic Devices
  • 批准号:
    9720424
  • 项目类别:
    Standard Grant
  • 资助金额:
    $45.4万
  • 财政年份:
    1997
  • 负责人:
    John Hauser
  • 依托单位:
MRI: Acquisition of Chemical Mechanical Polishing System for Semiconductor Research
  • 批准号:
    9724387
  • 项目类别:
    Standard Grant
  • 资助金额:
    $37.0万
  • 财政年份:
    1997
  • 负责人:
    John Hauser
  • 依托单位:
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