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Integrated Laboratory For Introductory Math, Physics, And Engineering

Integrated Laboratory For Introductory Math, Physics, And Engineering
数学、物理和工程学入门综合实验室
批准号:
9352600
负责人:
John Hauser
金额:
$10.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1993
资助国家:
美国
项目状态:
已结题
起止时间:
1993-06-01 至 1995-11-30

项目摘要

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中文摘要
翻译
该项目涉及实施一个综合或公共实验室,供工科学生在他们的数学、物理和工程入门课程中使用。拟议中的实验室是一个新颖的课程修改实验的一部分,该实验是作为NSF赞助的SUCCESS计划的一部分单独资助的。计划中的课程修订解决了本科工科课程改革中的关键问题,并开发了一种新的本科工科教育实验模式。特别是,在关键的一年级,正在实施一种新的模式,将数学、物理和工程导论整合在一起。该项目旨在培养一年级学生对工程学的早期接触,并强调数学、物理和工程方法方面的共同知识基础。综合教学法的创新特点包括:(1)在数学、物理和工程之间实行灵活的每周学时分配概念;(2)在三个学科领域之间实施“即时”学习概念;(3)为三个学科领域建立一个以计算机为导向的公共实验室。
英文摘要
The project involves the implemention of an integrated or common laboratory to be used by engineering students in their introductory mathematics, physics, and engineering courses. The proposed laboratory is part of a novel curriculum revision experiment which is being funded separately as part of the NSF sponsored SUCCEED program. The planned curriculum revisions address critical issues in the restructuring of the undergraduate engineering curriculum and a new experimental model for undergraduate engineering education is developed. In particular, a new model for integrating mathematics, physics, and introductory engineering at the critical freshman year is being implemented. The project seeks to develop an early exposure to engineering and an emphasis on the common knowledge base from mathematics, physics, and the engineering method at the freshman year. Innovative features of the integrated teaching approach include: (1) a flexible hours per week distribution concept between mathematics, physics, and engineering, (2) implementation of "just-in-time" learning concepts between the three subject areas and, (3) a common computer- oriented laboratory for the three subject areas.
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CPS: Synergy: Collaborative Research: Semantics of Optimization for Real Time Intelligent Embedded Systems (SORTIES)
  • 批准号:
    1446812
  • 项目类别:
    Standard Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    2015
  • 负责人:
    John Hauser
  • 依托单位:
Enhanced Single Wafer Research Cluster for Advanced Electronic Materials Processing
  • 批准号:
    9872794
  • 项目类别:
    Standard Grant
  • 资助金额:
    $37.46万
  • 财政年份:
    1998
  • 负责人:
    John Hauser
  • 依托单位:
Chemical Composition Profiling of Ultra-thin Silcon Dioxide/Silicon Nitride and Other Alternative Multilayer Dielectrics for Advanced Microelectronic Devices
  • 批准号:
    9720424
  • 项目类别:
    Standard Grant
  • 资助金额:
    $45.4万
  • 财政年份:
    1997
  • 负责人:
    John Hauser
  • 依托单位:
MRI: Acquisition of Chemical Mechanical Polishing System for Semiconductor Research
  • 批准号:
    9724387
  • 项目类别:
    Standard Grant
  • 资助金额:
    $37.0万
  • 财政年份:
    1997
  • 负责人:
    John Hauser
  • 依托单位:
海外基金