The Quantum Modulated Transistor: Fabrication and Charac- terization
量子调制晶体管:制造和表征
基本信息
- 批准号:9010035
- 负责人:
- 金额:$ 7.41万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:1990
- 资助国家:美国
- 起止时间:1990-07-01 至 1993-06-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
We propose an experimental investigation on the fabrication and characterization of nanometer-scale structures exhibiting quantum interference effects in gallium arsenide semiconductor materials with applications to novel quantum effect devices. The primary objective of the proposed research is to demonstrate transistor action by quantum modulation in nanostructures. Specifically, we propose to fabricate and characterize a three terminal, T-shaped device called the Quantum Modulated Transistor (QMT) as a vehicle to investigate the feasibility of realizing transistor action based on confinement-induced quantum effects. The quasi-one-dimensional electron channel for the QMT will be fabricated using electron beam lithography and chemically assisted ion beam etching techniques in A1GaAs/GaAs modulation-doped field effect transistor (MODFET) heterostructures. Molecular- beam-epitaxy grown planar-doped, single and double heterostructure MODFET materials exhibiting enhanced mobility and electron sheet density will be used. The QMT will be exhaustively characterized through current-voltage measurements at various temperatures down to 1 K. A successful realization of high confinement nanostructures and the QMT should lead to the observation of novel quantum effects and provide a new class of ultra-small devices for performing complex electronic functions.
我们提出了一个实验研究, 纳米尺度的制备和表征 表现出量子干涉效应的结构 砷化镓半导体材料, 应用于新型量子效应器件。 的 拟议研究的主要目标是 用量子调制演示晶体管的作用 在纳米结构中。 具体来说,我们建议制造和表征 一个三端T形设备,叫做量子 调制晶体管(QMT)作为一种工具, 研究实现晶体管动作的可行性 基于限制诱导的量子效应。 的 QMT准一维电子通道 将使用电子束光刻技术制造 和化学辅助离子束蚀刻技术 In Al GaAs/GaAs调制掺杂场效应 晶体管(MODFET)异质结构。 分子- 束外延生长的平面掺杂的,单和双 异质结构MODFET材料表现出 增强的迁移率和电子片密度将 采用 将对QMT进行详尽描述 通过在不同温度下的电流-电压测量 温度降至1 K。 成功实现 高限制纳米结构和QMT 应该可以观察到新的量子 并提供了一种新的超小型设备 用于执行复杂的电子功能。
项目成果
期刊论文数量(0)
专著数量(0)
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会议论文数量(0)
专利数量(0)
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Ilesanmi Adesida其他文献
Ultra-dense hydrogen silsesquioxane (HSQ) structures on thin silicon nitride membranes
- DOI:
10.1016/j.mee.2008.12.055 - 发表时间:
2009-04-01 - 期刊:
- 影响因子:
- 作者:
Sookyung Choi;Minjun Yan;Liang Wang;Ilesanmi Adesida - 通讯作者:
Ilesanmi Adesida
Breakdown Voltage Enhancement of AlGaN/GaN High-Electron-Mobility Transistors via Selective-Area Growth for Ohmic Contacts over Ion Implantation
- DOI:
10.1007/s11664-010-1139-y - 发表时间:
2010-03-09 - 期刊:
- 影响因子:2.500
- 作者:
Liang Pang;Hui-Chan Seo;Patrick Chapman;Ilesanmi Adesida;Kyekyoon (Kevin) Kim - 通讯作者:
Kyekyoon (Kevin) Kim
Ilesanmi Adesida的其他文献
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{{ truncateString('Ilesanmi Adesida', 18)}}的其他基金
MRI: Acquisition of Analytical Tools for Imaging and Spectroscopy of Nanoscale Structures and Systems
MRI:获取纳米级结构和系统成像和光谱分析工具
- 批准号:
0421377 - 财政年份:2004
- 资助金额:
$ 7.41万 - 项目类别:
Standard Grant
GOALI: SiGe/Si Modulation-Doped Field-Effect Transistors for Low Power, High Speed Circuit Applications
GOALI:适用于低功耗、高速电路应用的 SiGe/Si 调制掺杂场效应晶体管
- 批准号:
9710418 - 财政年份:1997
- 资助金额:
$ 7.41万 - 项目类别:
Continuing Grant
Processing and Devices for Integrated Optoelectronics in GaN and Related Compounds
GaN 及相关化合物集成光电器件的加工和器件
- 批准号:
9521671 - 财政年份:1995
- 资助金额:
$ 7.41万 - 项目类别:
Continuing Grant
Materials and Processes for Nanoelectronics
纳米电子学材料和工艺
- 批准号:
9202294 - 财政年份:1992
- 资助金额:
$ 7.41万 - 项目类别:
Continuing Grant
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