Materials and Processes for Nanoelectronics

提出的研究目标是开发分子束外延低维纳米结构外延生长和材料加工领域的关键技术，使尺寸小于现有器件的功能纳米器件的制备和表征。预计这一维度将导致观察到新的量子和弹道效应，这将反过来导致具有更高性能和在液氮温度以上运行的新型器件。我们的愿景是，这项研究的完成将导致1)对创新生长和再生长方法的新见解，2)对表征超小异质层和界面的新见解3)更先进的纳米制造技术，4)了解纳米结构和器件中的新物理效应，5)改进和创新的纳米器件。

The goals of the proposed research are to develop key technologies in the fields of epitaxial growth of low-dimensional nanostructures by molecular beam epitaxy and materials processing to make possible the fabrication and characterization of functional nanodevices with dimensions smaller than existing devices. It is expected that this dimensionality will lead to the observation of new quantum and ballistic effects which will in turn lead to novel devices with higher performance and operation above liquid nitrogen temperatures. It is our vision that the completion of this research should lead to 1) new insight into innovative growth and regrowth methods, 2) new insight into characterizing ultra-small heterolayers and interfaces 3) more advanced nanofabrication technologies, 4) an understanding of new physical effects in nanoscale structures and devices, 5) improved and innovative nanodevices.