An Investigation into the Fundamental Principles of Plasmaless Si Etching

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In this project, funded by the Experimental Physical Chemistry Program of the Chemistry Division, Prof. Sylvia T. Ceyer of the Massachusetts Institute of Technology and her postdoctoral and graduate student researchers will investigate the plasmaless etching of Si with a variety of fluorine containing molecules using a combination of molecular beam and surface science methods. The ultimate goal of this research is to learn more about the underlying chemical principles behind plasmaless etching. Results from this research may result in improved technology in the semiconductor industry.In addition to the broader technological impact of the proposed research, the young researchers working on this project will gain expertise in a number of sophisticated research methods, which will allow them to pursue careers in either industry or academia. Prof. Ceyer will incorporate results from her research into workshops for teachers of high school chemistry and into presentations for undergraduates at primarily undergraduate institutions.