An Investigation into the Fundamental Principles of Plasmaless Si Etching

非等离子硅刻蚀基本原理的研究

• 批准号: 0517786
• 负责人: Sylvia Ceyer
• 金额: $ 58.6万
• 依托单位: Massachusetts Institute of Technology
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-09-01 至 2009-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0517786&HistoricalAwards=false
• 关键词: Investigation; into; Fundamental; Principles; Plasmaless

In this project, funded by the Experimental Physical Chemistry Program of the Chemistry Division, Prof. Sylvia T. Ceyer of the Massachusetts Institute of Technology and her postdoctoral and graduate student researchers will investigate the plasmaless etching of Si with a variety of fluorine containing molecules using a combination of molecular beam and surface science methods. The ultimate goal of this research is to learn more about the underlying chemical principles behind plasmaless etching. Results from this research may result in improved technology in the semiconductor industry.In addition to the broader technological impact of the proposed research, the young researchers working on this project will gain expertise in a number of sophisticated research methods, which will allow them to pursue careers in either industry or academia. Prof. Ceyer will incorporate results from her research into workshops for teachers of high school chemistry and into presentations for undergraduates at primarily undergraduate institutions.

本课题由化学系实验物理化学项目资助，由美国麻省理工学院物理系物理化学系物理马萨诸塞州理工学院的Ceyer和她的博士后和研究生研究人员将使用分子束和表面科学方法相结合的方法，研究用各种含氟分子对Si进行无等离子体蚀刻。 这项研究的最终目标是更多地了解非等离子体蚀刻背后的化学原理。 这项研究的结果可能会改善半导体行业的技术。除了拟议研究的更广泛的技术影响外，参与该项目的年轻研究人员还将获得许多复杂研究方法的专业知识，这将使他们能够在工业界或学术界从事职业生涯。 Ceyer教授将把她的研究成果纳入高中化学教师的研讨会，并为主要本科院校的本科生做演讲。