Japan Long-Term Research Visit: Basic Mechanisms and Engineering Issues for the Fabrication of Smooth Diamond andCubic Boron Nitride Films

日本长期考察访问：光滑金刚石和立方氮化硼薄膜制备的基本机理和工程问题

• 批准号: 9200869
• 负责人: Yonhua Tzeng
• 金额: $ 4.7万
• 依托单位: Auburn University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-03-15 至 1993-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9200869&HistoricalAwards=false
• 关键词: Japan; Long; Term; Research; Visit

This award will support a long-term research visit by Professor Yonhua Tzeng, Department of Electrical Engineering, Auburn University in Alabama to Japan for a cooperative research project with Professor Masanori Yoshikawa, Department of Mechanical Engineering, Tokyo Institute of Technology. The researchers plan to undertake a study on diamond film synthesis by arc discharge plasma jets and the polishing of deposited diamond films by mechanical and chemical means. During his visit to Japan Professor Tzeng will also be visiting Professors Masao Murakawa and Y. Hirose in the Department of Electrical Engineering at the Nippon Institute of Technology in Saitama. During these visits they will be performing research on ion plating of cubic boron nitride films and flame CD of diamond films. The research results have the potential of achieving high-rate deposition and cost-effective polishing of diamond and cubic boron nitride films which are crucial to practical applications of these high performance materials to electronic, optical, thermal, and mechanical devices and systems. Professors Yoshikawa, Murakawa and Hirose are all recognized experts and their laboratories are world leaders in the areas of diamond and cubic boron nitride films. Their previous experience, coupled with Professor Tzeng's expertise in the field should provide a fruitful collaboration. It is expected that collaborations between the researchers will continue even after the formal agreement has terminated.

该奖项将支持教授的长期研究访问 Yonhua Tzeng，电气工程系，奥本 美国亚拉巴马大学到日本进行合作研究项目 与Masanori Yoshikawa教授，机械系 东京工业大学工学部。 研究人员计划 进行电弧放电合成金刚石薄膜的研究 等离子体射流和沉积金刚石膜的抛光 机械和化学手段。 访日期间 曾教授亦会拜访村川正夫教授 和Y. Hirose在电气工程系， 琦玉的日本技术大学。 在这些访问期间 他们将进行立方硼离子镀的研究 氮化物薄膜和金刚石薄膜的火焰CD。 该研究成果具有实现高倍率的潜力 金刚石和立方体的沉积和成本有效的抛光 氮化硼薄膜在实际应用中至关重要 这些高性能材料的电子，光学， 热的和机械的装置和系统。 教授 吉川、村川和广濑都是公认的专家， 他们的实验室在钻石领域处于世界领先地位， 立方氮化硼薄膜 他们以前的经验，加上 以曾教授在该领域的专业知识， 富有成效的合作。 预计合作 研究人员之间的交流甚至在正式的 协议已经终止。