Conference: Organization of the 1992 Soft-X-Ray Projection Lithography Topical Meeting to be held in Monterey, CA, on April 6-8, 1992.

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This grant is for support of the 1992 Soft-X-Ray Projection Lithography Topical Meeting in Monterey, CA, 6-8 April 1992. Soft- X-Ray projection lithography is a leading candidate technology for the fabrication of integrated circuits and electronic and optoelectronic devices with design rules reaching ultimately below 0.1 um. This topical meeting will highlight recent advances in critical component technologies, such as in areas of soft-x-ray optical design, optical component fabrication and characterization, imaging, multilayer reflective coatings, sources, resists, registration and alignment systems, mask technology, system integration and IC process engineering. The first meeting on this subject was held last year at the beginning of major funding of this program by DARPA and DOC. The support requested from NSF would be used to enable students and postdocs field working in this field who have submitted contributed papers to attend the meeting and present their work. This is an important emerging technology, and the requested use of NSF funds for student and postdoc support will be very effective in enhancing the base of trained researchers in the field.