Conference: Organization of the 1992 Soft-X-Ray Projection Lithography Topical Meeting to be held in Monterey, CA, on April 6-8, 1992.

这笔赠款用于支持1992年4月6日至8日在加利福尼亚州蒙特雷举行的1992年软x射线投影光版技术专题会议。软x射线投影光刻技术是制造集成电路、电子和光电子器件的领先候选技术，其设计规则最终达到0.1 um以下。本次专题会议将重点介绍关键元件技术的最新进展，如软x射线光学设计、光学元件制造和表征、成像、多层反射涂层，源，抗蚀剂，配准和对准系统，掩模技术，系统集成和集成电路工艺工程。去年，在DARPA和DOC为该项目提供主要资助之初，就该主题举行了第一次会议。NSF请求的支持将用于在该领域工作并提交论文的学生和博士后参加会议并展示他们的工作。这是一项重要的新兴技术，要求使用国家科学基金会的资金来支持学生和博士后，这将非常有效地增强该领域训练有素的研究人员的基础。

This grant is for support of the 1992 Soft-X-Ray Projection Lithography Topical Meeting in Monterey, CA, 6-8 April 1992. Soft- X-Ray projection lithography is a leading candidate technology for the fabrication of integrated circuits and electronic and optoelectronic devices with design rules reaching ultimately below 0.1 um. This topical meeting will highlight recent advances in critical component technologies, such as in areas of soft-x-ray optical design, optical component fabrication and characterization, imaging, multilayer reflective coatings, sources, resists, registration and alignment systems, mask technology, system integration and IC process engineering. The first meeting on this subject was held last year at the beginning of major funding of this program by DARPA and DOC. The support requested from NSF would be used to enable students and postdocs field working in this field who have submitted contributed papers to attend the meeting and present their work. This is an important emerging technology, and the requested use of NSF funds for student and postdoc support will be very effective in enhancing the base of trained researchers in the field.