Conference: Organization of the 1992 Soft-X-Ray Projection Lithography Topical Meeting to be held in Monterey, CA, on April 6-8, 1992.

这笔赠款是为了支持1992年4月6-8日在加利福尼亚州蒙特利举行的1992年软X射线投影光刻专题会议。软X射线投影光刻技术是制造集成电路、电子和光电子的主要候选技术设计规则最终达到0.1um以下的设备。本次专题会议将突出关键部件技术的最新进展，例如软X射线光学设计领域，光学元件制造和表征、成像、多层反射涂层、源、抗蚀剂配准和对准系统、掩模技术、系统集成和IC工艺工程。关于这一主题的第一次会议是去年DARPA和DOC为该计划提供主要资金时举行的。NSF要求的支持将用于使在该领域工作的学生和博士后能够将投稿论文提交到出席会议并介绍他们的工作。这是一项重要的新兴技术，申请使用NSF的资金用于学生和博士后支持，将非常有效地加强该领域训练有素的研究人员的基础。

This grant is for support of the 1992 Soft-X-Ray Projection Lithography Topical Meeting in Monterey, CA, 6-8 April 1992. Soft- X-Ray projection lithography is a leading candidate technology for the fabrication of integrated circuits and electronic and optoelectronic devices with design rules reaching ultimately below 0.1 um. This topical meeting will highlight recent advances in critical component technologies, such as in areas of soft-x-ray optical design, optical component fabrication and characterization, imaging, multilayer reflective coatings, sources, resists, registration and alignment systems, mask technology, system integration and IC process engineering. The first meeting on this subject was held last year at the beginning of major funding of this program by DARPA and DOC. The support requested from NSF would be used to enable students and postdocs field working in this field who have submitted contributed papers to attend the meeting and present their work. This is an important emerging technology, and the requested use of NSF funds for student and postdoc support will be very effective in enhancing the base of trained researchers in the field.