Conference: Organization of the 1992 Soft-X-Ray Projection Lithography Topical Meeting to be held in Monterey, CA, on April 6-8, 1992.

这笔赠款是为了支持 1992年软X射线投影 光刻专题会议在 1992年4月6日至8日，加利福尼亚州蒙特雷。 软- X射线投影光刻是一种 领先的候选技术， 制造集成电路 电子和光电 设计规则达到 最终低于0.1 μ m。 这 专题会议将突出 关键技术的最新进展 组件技术，例如 软X射线光学设计领域， 光学元件制造和 表征，成像， 多层反射涂层， 来源、抗蚀剂、注册和 对准系统，掩模技术， 系统集成与IC工艺 工程. 第一次会议在 这个课题去年在 主要资金的开始 DARPA和DOC的项目。 的 要求NSF提供的支持将 用来让学生和博士后 在这个领域工作的人 提交论文 出席会议，并介绍他们的 工作 这是一个重要的新兴 技术，并要求使用 NSF学生和博士后基金 支持将非常有效， 加强受训人员的基础 研究人员在该领域。

This grant is for support of the 1992 Soft-X-Ray Projection Lithography Topical Meeting in Monterey, CA, 6-8 April 1992. Soft- X-Ray projection lithography is a leading candidate technology for the fabrication of integrated circuits and electronic and optoelectronic devices with design rules reaching ultimately below 0.1 um. This topical meeting will highlight recent advances in critical component technologies, such as in areas of soft-x-ray optical design, optical component fabrication and characterization, imaging, multilayer reflective coatings, sources, resists, registration and alignment systems, mask technology, system integration and IC process engineering. The first meeting on this subject was held last year at the beginning of major funding of this program by DARPA and DOC. The support requested from NSF would be used to enable students and postdocs field working in this field who have submitted contributed papers to attend the meeting and present their work. This is an important emerging technology, and the requested use of NSF funds for student and postdoc support will be very effective in enhancing the base of trained researchers in the field.