Chemical Vapor Deposition from the Metal Hexacarbonyls

该奖项是根据先进材料和加工 化学系的一项方案，以支持 辛格马斯特·埃尔南德斯博士 该研究将提供一个 了解微观化学过程， 激光辅助和热解金属薄膜沉积 第VI族六羰基化合物。 膜的组成和形态将是 通过扫描俄歇光谱学探测。 化学气相 沉积过程将与低温基质隔离相结合 反应性中间体。 基质分离种属将 通过傅立叶变换红外和紫外-可见光谱鉴别 光谱学 这两项研究将相辅相成， 提供了对膜沉积机制的额外了解， 杂质的掺入，以及对 可以去除或防止膜杂质。 %%% 对金属薄膜机理的基本认识 沉积和所涉及的中间体将具有很大的价值， 微电子工业。

This award is made under the Advanced Materials and Processing Program in the Chemistry Division in support of the research of Dr. Singmaster-Hernandez. The research will provide an understanding of the microscopic chemical processes leading to both laser-assisted and pyrolytic thin metal film deposition from the Group VI hexacarbonyls. Film composition and morphology will be probed by Scanning Auger Spectroscopy. The chemical vapor deposition process will be coupled with cryogenic matrix isolation of the reactive intermediates. Matrix isolated species will be identified by Fourier Transform Infrared and UV-Visible spectroscopies. Both studies will complement each other and provide additional insight into the mechanisms of film deposition, incorporation of impurities, and possible insights into ways that film impurities can be removed or prevented. %%% A fundamental understanding of the mechanism of thin metal film deposition and the intermediates involved will be of great value to the microelectronics industry.