Chemical Vapor Deposition from the Metal Hexacarbonyls

该奖项是根据化学部先进材料和加工计划颁发的，以支持Singmaster-Hernandez博士的研究。这项研究将提供对激光辅助和热解第六族六羰基金属薄膜沉积的微观化学过程的理解。薄膜的成分和形貌将通过扫描俄歇能谱进行探测。化学气相沉积过程将与反应中间体的低温基质分离相结合。基质分离的物种将通过傅里叶变换红外和紫外可见光谱进行鉴定。这两项研究将相辅相成，为薄膜沉积的机制、杂质的加入提供更多的见解，并可能对去除或防止薄膜杂质的方法提供见解。对金属薄膜沉积机理和所涉及的中间体有一个基本的了解，这对微电子工业具有重要的价值。

This award is made under the Advanced Materials and Processing Program in the Chemistry Division in support of the research of Dr. Singmaster-Hernandez. The research will provide an understanding of the microscopic chemical processes leading to both laser-assisted and pyrolytic thin metal film deposition from the Group VI hexacarbonyls. Film composition and morphology will be probed by Scanning Auger Spectroscopy. The chemical vapor deposition process will be coupled with cryogenic matrix isolation of the reactive intermediates. Matrix isolated species will be identified by Fourier Transform Infrared and UV-Visible spectroscopies. Both studies will complement each other and provide additional insight into the mechanisms of film deposition, incorporation of impurities, and possible insights into ways that film impurities can be removed or prevented. %%% A fundamental understanding of the mechanism of thin metal film deposition and the intermediates involved will be of great value to the microelectronics industry.