High Concentration Ozone Production for Semiconductor Manufacturing

研究工作的目标是为半导体制造和材料加工业开发能够在非常高浓度下产生臭氧的紧凑、高效的设备。使用臭氧化学的新兴工艺技术创造了对这种设备的需求。在第一阶段建造的一种新的实验发生器产生了高浓度臭氧，其产量(效率)是传统发生器的三倍。采用这种新设计的全尺寸发电机预计将是传统发电机的四分之一。第二阶段研究的四个目标是建造一个新的实验室规模发生器，其中包括第一阶段研究提出的设计改进建议利用实验室规模发生器来探索几种有希望的方法，以获得更多的产量改进，设计和建造商业规模发生器，增加了模块化臭氧产生系统的设计，标称生产能力为每天2至8千兆克/天，浓度为10%至15%。如果成功，这项研究将导致开发一种关键的制造资源，用于制造下一代半导体器件。

The objective of the researched work is to develop compact, efficient equipment capable of generating ozone at very high concentrations for the semiconductor manufacturing and materials processing industry. Emerging process technologies using ozone chemistry have created the need for such equipment. A novel experimental generator, constructed in phase I, has produced high concentration ozone at three times the yield (efficiency) of conventional generators. Full scale generators incorporating this novel design are expected to be one-forth the size of conventional generators. The four goals for the phase II research are construction of a new laboratory scale generator which incorporates the design improvements suggested by the phase I research utilization of the laboratory scale generator to explore several promising approaches to obtaining additional yield improvements, design and construction of a commercial scale generator, added design of modular ozone generation systems with a nominal production capacity of 2 to 8 kgm/day at 10 to 15 percent concentration. If successful, this research will lead to the development of a critical manufacturing resource for use in the fabrication of the next generation of semiconductor devices.