High Concentration Ozone Production for Semiconductor Manufacturing

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The objective of the researched work is to develop compact, efficient equipment capable of generating ozone at very high concentrations for the semiconductor manufacturing and materials processing industry. Emerging process technologies using ozone chemistry have created the need for such equipment. A novel experimental generator, constructed in phase I, has produced high concentration ozone at three times the yield (efficiency) of conventional generators. Full scale generators incorporating this novel design are expected to be one-forth the size of conventional generators. The four goals for the phase II research are construction of a new laboratory scale generator which incorporates the design improvements suggested by the phase I research utilization of the laboratory scale generator to explore several promising approaches to obtaining additional yield improvements, design and construction of a commercial scale generator, added design of modular ozone generation systems with a nominal production capacity of 2 to 8 kgm/day at 10 to 15 percent concentration. If successful, this research will lead to the development of a critical manufacturing resource for use in the fabrication of the next generation of semiconductor devices.